Low-frequency Raman modes as fingerprints of layer stacking configurations of transition metal dichalcogenides

ORAL

Abstract

The tunable optoelectronic properties of stacked two-dimensional (2D) crystal monolayers are determined by their stacking orientation, order, and atomic registry. Atomic-resolution Z-contrast scanning transmission electron microscopy (AR-Z-STEM) can be used to determine the exact atomic registration between different layers in few-layer 2D stacks; however, fast and relatively inexpensive optical characterization techniques are essential for rapid development of the field. Using two- and three-layer MoSe2 and WSe2 crystals synthesized by chemical vapor deposition, we show that the generally unexplored low-frequency (LF) Raman modes (<50 cm-1) that originate from interlayer vibrations can serve as fingerprints to characterize not only the number of layers, but also their stacking configurations [Puretzky and Liang et al, ACS Nano 2015, 9, 6333]. First-principles Raman calculations and group theory analysis corroborate the experimental assignments determined by AR-Z-STEM and show that the calculated LF mode fingerprints are related to the 2D crystal symmetries. Our combined experimental/theoretical work demonstrates the LF Raman modes potentially more effective than HF Raman modes to probe the layer stacking and interlayer interaction for 2D materials.

*The authors acknowledge support from Eugene P. Wigner Fellowship at the Oak Ridge National Laboratory and the Center for Nanophase Materials Sciences, a DOE Office of Science User Facility.

Authors

  • Liangbo Liang

    • RPI, ORNL
    • Oak Ridge National Lab
    • Rensselaer Polytechnic Institute
    • RPI,ORNL
  • Alexander Puretzky

    • Oak Ridge National Lab
  • Bobby Sumpter

    • Oak Ridge National Lab
  • Vincent Meunier

    • Rensselaer Polytechnic Institute
  • David Geohegan

    • Oak Ridge National Lab