Extremely Large Magnetoresistance in Bi$_{\mathrm{0.96}}$Sb$_{\mathrm{0.04}}$

POSTER

Abstract

Recent experimental evidence for Weyl fermions in topological semimetals has attracted considerable attention. These materials are three-dimensional analogue of graphene. The present work is motivated by the recent prediction of Weyl semi-metallic phase in Bi$_{\mathrm{1-x}}$Sb$_{\mathrm{x}}$ alloys. In this paper we present the electronic transport properties studied under high applied magnetic fields in Bi$_{\mathrm{0.96}}$Sb$_{\mathrm{0.04}}$ alloys. The sample exhibits extremely high magneto-resistance; MR(5 K, 8 T) $=$ 9.8\texttimes 10$^{\mathrm{4}}$ {\%}. This value is comparable to the MR observed in recently discovered other members of these emergent materials. Most importantly, this composition shows large MR at room temperature, MR (300 K, 8 T) $=$ 435{\%}, which is almost twice to that observed in Dirac semimetal Cd$_{\mathrm{3}}$As$_{\mathrm{2}}$ ($=$ 200 {\%} at 14.5 T) and Weyl semimetal NbP ($=$ 250{\%} at 9 T). We also discuss single crystal growth techniques as well as Hall and Shubnikov de Haas (SdH) oscillation data. \textbf{References } [1] S. Singh et.al, \textit{arxiv:1512.00863v2} (2015). [2] C. Shekhar et.al, \textit{Nat. Phys.}\textbf{11} 645--650 (2015). [3] Z. Wang et.al, \textit{Phys. Rev. B} \textbf{88 }125427 (2013).

*We acknowledge the DIST-FIST supported low temperature-high magnetic field facility at JNU and AIRF, JNU for the access of experimental facilities to carry out this study. Sudesh and P. Kumar thank UGC, (Government of India) for financial support

Authors

  • Sudesh Sudesh

    • Jawahar lal Nehru University, New Delhi, India
    • School of Physical Sciences, Jawaharlal Nehru University, New Delhi-110067, India
  • Pawan Kumar

    • School of Physical Sciences, Jawaharlal Nehru University, New Delhi-110067, India
  • Satyabrata Patnaik

    • Jawahar lal Nehru University, New Delhi, India
    • School of Physical Sciences, Jawaharlal Nehru University, New Delhi-110067, India