Profiling the local carrier concentration across a semiconductor quantum dot

ORAL

Abstract

We profile the local carrier concentration, n, across epitaxial InAs/GaAs quantum dots (QDs) consisting of 3D islands on top of a 2D alloy layer. We use scanning thermoelectric microscopy to measure the temperature gradient-induced voltage, which is then converted to the local Seebeck coefficient, S. The S profile is then converted to a conduction band-edge profile and compared with Poisson-Schrodinger band-edge simulations. Our combined computational-experimental approach suggests a reduced carrier concentration in the QD center in comparison to that of the 2D alloy layer. The relative roles of free carrier trapping and/or dopant expulsion are discussed.

*This material is based upon work supported by the U.S. DoE under Award Number DE-PI0000012, the NSF GRFP under Grant No. DGE 1256260, the U.S. DoE under contract DE-FG02-06ER46339, and CSTEC, an EFRC funded by the U.S. DoE under Award No. DE-SC0000957.

Authors

  • J.C. Walrath

    • Univ of Michigan - Ann Arbor
    • University of Michigan, Ann Arbor, MI
  • Yen-Hsiang Lin

    • Univ of Michigan - Ann Arbor
  • S. Huang

    • Univ of Michigan - Ann Arbor
  • R.S. Goldman

    • Univ of Michigan - Ann Arbor