CVD-grown graphene on LaAlO$_3$/SrTiO$_3$: transferring, patterning and c-AFM lithography

ORAL

Abstract

Interesting properties are anticipated when graphene is integrated with complex-oxide heterostructures. To create these structures, single-layer graphene is grown by chemical vapor deposition and transferred onto LaAlO$_3$/SrTiO$_3$. following a deep UV exposure method, the size and position of the graphene can be patterned to be compatible with the c-AFM lithography technique applied on LaAlO$_3$/SrTiO$_3$. Local control of metal-insulator transition at LaAlO$_3$/SrTiO$_3$ interface is reversibly achieved using the c-AFM lithography technique without observable graphene degradation. The graphene layer can also serve as a top gate to modulate the LaAlO$_3$/SrTiO$_3$ interface conductance.

*We gratefully acknowledge support for this work from NSF (DMR-1124131 and DMR-1234096), ONR (N00014-13-1-0806) and AFOSR (FA9550-10-1-0524 and FA9550-12-1-0342)

Authors

  • Mengchen Huang

    • University of Pittsburgh
    • Univ of Pittsburgh
  • Giriraj Jnawali

    • Univ of Pittsburgh
  • Jen-Feng Hsu

    • Univ of Pittsburgh
  • Hyungwoo Lee

    • University of Wisconsin-Madison
    • University of Wisconsin - Madison
    • Univ of Wisconsin-Madison
  • Sangwoo Ryu

    • University of Wisconsin-Madison
    • University of Wisconsin - Madison
    • Univ of Wisconsin-Madison
  • Feng Bi

    • Univ of Pittsburgh
  • Lu Chen

    • Univ of Pittsburgh
  • Fereshte Ghahari

    • Harvard Univ
  • Jayakanth Ravichandran

    • Dept. of Physics, Harvard University
    • Harvard Univ
  • Philip Kim

    • Dept. of Physics, Harvard University
    • Harvard Univ
  • Chang-Beom Eom

    • Dept of MatSci and Engr, Univ of Wisconsin
    • University of Wisconsin-Madison
    • University of Wisconsin - Madison
    • Univ of Wisconsin-Madison
  • Brian D'Urso

    • Univ of Pittsburgh
    • University of Pittsburgh
  • Patrick Irvin

    • University of Pittsburgh
    • Univ of Pittsburgh
  • Jeremy Levy

    • Univ of Pittsburgh