Focus Session: Block Copolymer Thin Films II
FOCUS · D42 ·
Presentations
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Minimal Topographic Surfaces for Directed Self-assembly of Cylinder-forming Block Copolymer Thin films with Lateral Order
ORAL
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Authors
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Jaewon Choi
- Department of Polymer Science and Engineering, University of Massachusetts Amherst
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Kenneth Carter
- Department of Polymer Science and Engineering, University of Massachusetts Amherst
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Thomas Russell
- Amherst UMass
- Univ of Mass - Amherst
- Department of Polymer Science and Engineering, University of Massachusetts Amherst
- University of Massachusetts Amherst
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Pathways toward unidirectional alignment in block copolymer thin films on faceted surfaces
ORAL
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Authors
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Ilja Gunkel
- ALS, Lawrence Berkeley National Lab
- Lawrence Berkeley National Laboratory
- Adolphe Merkle Institute
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Xiaodan Gu
- University of Massachusetts
- Stanford University
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Abhinav Sarje
- Lawrence Berkeley Natl Lab
- Lawrence Berkeley National Laboratory
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Alexander Hexemer
- Lawrence Berkeley Lab
- Lawrence Berkeley Natl Lab
- ALS, Lawrence Berkeley National Lab
- Lawrence Berkeley National Laboratory
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Thomas Russell
- Amherst UMass
- Univ of Mass - Amherst
- Department of Polymer Science and Engineering, University of Massachusetts Amherst
- University of Massachusetts Amherst
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Combining Graphoepitaxy and Electric Fields towards Uniaxial Alignment of Solvent-annealed Cylinder forming Poly(styrene)-\textit{block}-poly(dimethylsiloxane) block copolymers
ORAL
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Authors
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Christine Kathrein
- RWTH Aachen University, Leibniz Institut f\"ur Interaktive Materialien
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Wubin Bai
- Massachusetts Institute of Technology
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Larisa Tsarkova
- DWI - Leibniz Institute for Interactive Materials
- RWTH Aachen University, Leibniz Institut f\"ur Interaktive Materialien
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Tao Huang
- Tokyo Institute of Technology
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Apostolos Avgeropoulos
- University of Ioannina
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Alexander Boker
- RWTH Aachen University, Leibniz Institut f\"ur Interaktive Materialien
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Caroline Ross
- MIT (USA)
- Massachusetts Institute of Technology
- MIT
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Self-Assembly of Diblock Copolymers on Modified and Patterned Surfaces
COFFEE_KLATCH · Invited
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Authors
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Venkat Ganesan
- Department of Chemical Engineering, University of Texas at Austin, Austin, Texas 78712, USA
- University of Texas at Austin
- Department of Chemical Engineering, University of Texas at Austin, Austin, Texas 78712, United States
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Optimizing the Morphology Characterization of Block Copolymer Directed Self-Assembly Thin Films using Inverse Genetic Algorithms
ORAL
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Authors
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Adam Hannon
- NIST - Natl Inst of Stds \& Tech
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Daniel Sunday
- NIST - Natl Inst of Stds \& Tech
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Donald Windover
- NIST - Natl Inst of Stds \& Tech
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Christopher Liman
- NIST - Natl Inst of Stds \& Tech
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Juan de Pablo
- University of Chicago
- Univ of Chicago
- Institute for Molecular Engineering, University of Chicago
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Joseph Kline
- NIST - Natl Inst of Stds \& Tech
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Instantaneous Formation of Block Copolymer Patterns via Solvo-Thermal Casting Process
ORAL
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Authors
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Hyun Jung Jung
- Department of Chemical and Biological Engineering, Korea Univ.
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Sanghoon Woo
- Department of Chemical and Biological Engineering, Korea Univ.
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June Huh
- Department of Chemical and Biological Engineering, Korea Univ.
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Joona Bang
- Department of Chemical and Biological Engineering, Korea Univ.
- Department of Chemical and Biological Eng., Korea University, Seoul 136-713, Korea
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Cyclic Solvent Vapor Annealing for Rapid, Robust Vertical Orientation of Features in BCP Thin Films
ORAL
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Authors
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Sean Paradiso
- Univ of California - Santa Barbara
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Kris Delaney
- Univ of California - Santa Barbara
- UC Santa Barbara
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Glenn Fredrickson
- Univ of California - Santa Barbara
- UC Santa Barbara
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Decoupling Substrate Surface Interactions in Block Polymer Thin Film Self-Assembly
ORAL
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Authors
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Cameron Shelton
- University of Delaware
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Thomas Epps
- University of Delaware
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A Block Copolymer Self-Assembly Approach for 3D Nanoconfined Dopants in Semiconductors
ORAL
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Authors
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Bhooshan Popere
- University of California, Berkeley
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Boris Russ
- University of California, Berkeley
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William Chang
- University of California, Berkeley
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Andrew Heitsch
- The Dow Chemical Company, Midland, MI
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Peter Trefonas
- Dow Electronic Materials, Marlboro, MA
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Rachel Segalman
- University of California, Santa Barbara
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Defect motion and annihilation in block copolymer thin films
ORAL
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Authors
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Marcus Mueller
- Georg-August University, Institute for Theoretical Physics, Goettingen, Germany
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Weihua Li
- Georg-August University, Institute for Theoretical Physics, Goettingen, Germany
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Accelerating the search for globally stable block polymer microphases using genetic algorithms
ORAL
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Authors
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Carol Tsai
- UC Santa Barbara
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Kris Delaney
- Univ of California - Santa Barbara
- UC Santa Barbara
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Glenn Fredrickson
- Univ of California - Santa Barbara
- UC Santa Barbara
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Kinetic Aspects of Defect Annihilation in Block Copolymer Thin Films on Patterned Substrates.
ORAL
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Authors
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Su-Mi Hur
- University of Chicago
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Paulina Rincon-Delgadillo
- IMEC
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Vikram Thapar
- Cornell University
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Abelardo Ram\'Irez-Hern\'{a}ndez
- Argonne National Lab.
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Gurdaman Khaira
- University of Chicago
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Paul Nealey
- University of Chicago
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Marcus M\"{u}ller
- Institut fur Theoretische Physik
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Juan de Pablo
- University of Chicago
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