Transport of thin superconducting films and multilayer heterostructure made by Atomic layer deposition

We report the use of atomic layer deposition (ALD) to synthesize thin superconducting films and multilayer superconductor-insulator (S-I) heterostructures. The ALD technique applied to superconducting films opens the way for a variety of applications, including improving the performance and decreasing the cost of high energy particle accelerators, superconducting wires for energy storage, and bolometers for radiation detection. Furthermore, the atomic-scale thickness control afforded by ALD enables the study of superconductivity and associated phenomena in homogeneous layers in the ultra-thin film limit. In this respect, we will present results of ALD-grown transition metal-based superconductors, including nitrides, carbides, and silicides of niobium, nitrides of molybdenum and titanium, and Nb$_{\mathrm{1-x}}$Ti$_{\mathrm{x}}$N/AlN-based S-I heterostructures. Transport measurement for various composition and film thicknesses will be presented.