Tuning the Spring Constant of Cantilever-free Probe Arrays

The versatility of atomic force microscope (AFM) based techniques such as scanning probe lithography is due in part to the utilization of a cantilever that can be fabricated to match a desired application. In contrast, cantilever-free scanning probe lithography utilizes a low cost array of probes on a compliant backing layer that allows for high throughput nanofabrication but lacks the tailorability afforded by the cantilever in traditional AFM. Here, we present a method to measure and tune the spring constant of probes in a cantilever-free array by adjusting the mechanical properties of the underlying elastomeric layer. Using this technique, we are able to fabricate large-area silicon probe arrays with spring constants that can be tuned in the range from 7 to 150 N/m. This technique offers an advantage in that the spring constant depends linearly on the geometry of the probe, which is in contrast to traditional cantilever-based lithography where the spring constant varies as the cube of the beam width and thickness. To illustrate the benefit of utilizing a probe array with a lower spring constant, we pattern a block copolymer on a delicate 50 nm thick silicon nitride window.