Temperature Dependence of the Raman Spectra of CVD-grown Monolayer MoS$_2$
ORAL
Abstract
We investigated the temperature dependence of the E$^{1}_{\mathrm{2g}}$ and A$_{\mathrm{1g}}$ peaks in the Raman spectra of monolayer MoS$_{2}$ grown by chemical vapor deposition (CVD) on Si/SiO$_{2}$ substrates. Micro-Raman spectroscopy was carried out using the 532 nm laser excitation over the temperature range from 30 to 175 $^{\circ}$C. The extracted values of the temperature coefficient of these modes are $\chi =$ -0.013 cm$^{-1}$/$^{\circ}$C and $\chi =$ -0.016 cm$^{-1}$/$^{\circ}$C, respectively. The obtained results may shed light on the anomalous behavior of these modes observed in laser power dependent studies of monolayer MoS$_{2}$.
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Authors
A. Glen Birdwell
U.S. Army Research Laboratory, Sensors and Electron Devices Directorate, 2800 Powder Mill Rd, Adelphi, MD 20783, USA
Frank J. Crowne
U.S. Army Research Laboratory, Sensors and Electron Devices Directorate, 2800 Powder Mill Rd, Adelphi, MD 20783, USA
Terrance P. O'Regan
U.S. Army Research Laboratory, Sensors and Electron Devices Directorate, 2800 Powder Mill Rd, Adelphi, MD 20783, USA
Pankaj B. Shah
U.S. Army Research Laboratory, Sensors and Electron Devices Directorate, 2800 Powder Mill Rd, Adelphi, MD 20783, USA
Madan Dubey
U.S. Army Research Laboratory, Sensors and Electron Devices Directorate, 2800 Powder Mill Rd, Adelphi, MD 20783, USA
Sina Najmaei
Department of Mechanical Engineering and Materials Science, Rice University, Houston, TX 77005, USA
Zheng Liu
Department of Mechanical Engineering and Materials Science, Rice University, Houston, TX 77005, USA
Pulickel M. Ajayan
Rice University
Department of Mechanical Engineering and Materials Science, Rice University, Houston, TX 77005, USA
Jun Lou
Department of Mechanical Engineering and Materials Science, Rice University, Houston, TX 77005, USA
Rusen Yan
Department of Electrical Engineering, University of Notre Dame, Notre Dame, IN 46556, USA
National Institute of Standards and Technology, Physical Measurement Laboratory, Gaithersburg, Maryland, USA
NIST; University of Notre Dame
Huili Grace Xing
Department of Electrical Engineering, University of Notre Dame, Notre Dame, IN 46556, USA