Interface engineering of quantum Hall effects in digital transition-metal oxide heterostructures

ORAL

Abstract

Based on tight-binding modeling and first-principles calculations, we investigate possible quantum Hall effects in transition-metal oxide heterostructures. Bilayers of perovskite-type transition-metal oxides grown along the [111] crystallographic axis are found to be potential candidates for two-dimensional topological insulators. The topological band structure of these materials can be tune-tuned by changing dopant ions, substrates, and external gate voltages. We predict that LaAuO$_3$ bilayers have a topologically-nontrivial energy gap of about 0.15 eV, which is sufficiently large to realize the quantum spin-Hall effect at room temperature. We also discuss intriguing phenomena associated with the nearly flat topologically-nontrivial bands found in eg systems, such as fractional quantum Hall effect.

*S.O. and W.Z. were supported by US DOE, BES, MSE Division. D.X. was supported by LDRD, ORNL. N.N. was supported by MEXT (19048008, 19048015, 21244053). Computational support was provided by NERSC of US DOE.

Authors

  • Satoshi Okamoto

    • Materials Science and Technology Division, Oak Ridge National Laboratory
    • Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
  • Di Xiao

    • Materials Science and Technology Division, Oak Ridge National Laboratory
  • Wenguang Zhu

    • Department of Physics and Astronomy, University of Tennessee \& Materials Science and Technology Division, Oak Ridge National Laboratory
  • Ying Ran

    • Department of Physics, Boston College
  • Naoto Nagaosa

    • Department of Applied Physics, The University of Tokyo \& CMGR and CERG, RIKEN-ASI