Gradual thickness change of CuPc on MoOx on Oxygen Plasma Treated ITO
ORAL
Abstract
The thickness dependence of copper phthalocyanine (CuPc) interlayer on molybdenum trioxide (MoO$_3$) and conducting indium tin oxide (ITO) has been investigated with ultraviolet photoemission spectroscopy (UPS). We also investigated the air exposure effect on the CuPc/MoO$_3$/ITO interlayers. It was found that the MoO$_3$ interlayer substantially increased the substrate work function (WF). With the deposition of CuPc the WF decreased and saturated at the thickness of 80 {\AA}. We also found that 3x10$^6$ Langmuir (L) air exposure decreased both the MoO$_3$ WF and the interface dipole between CuPc/MoO$_3$ interface.
*The authors would like to acknowledge the support of the National Science Foundation under Grant No. DMR-1006098.
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