Distinct Monolayer Structure of DH6T Films Grown on Untreated SiO$_{2}$

ORAL

Abstract

Due to the relatively weak interactions between neighboring molecules, thin films of vacuum evaporated organic semiconductors can have different properties in monolayer films as compared to several monolayer and bulk-like films. We have structurally characterized monolayer and several monolayer films of dihexyl-sexithiophene (DH6T) using grazing incidence diffraction and near-edge x-ray absorption fine structure spectroscopy (NEXAFS), and electrically characterized low-coverage FET structures during deposition. The structural data indicate a distinct phase of DH6T in the monolayer which has a distorted unit cell and a distinct NEXAFS signature compared to thicker films. The hole mobility of $\sim$0.8 cm$^{2}$/V-s is approximately an order of magnitude higher than previously reported for vacuum deposited thick films of DH6T on unmodified SiO$_{2}$ surfaces.

*This work supported by the National Science Foundation through the University of Wisconsin Materials Research Science and Engineering Center under Grant No. DMR-1121288

Authors

  • Josef Spalenka

    • University of Wisconsin-Madison
  • Ehren Mannebach

    • University of Wisconsin-Madison
  • Phillip Johnson

    • University of Wisconsin-Madison
  • Zhonghou Cai

    • Advanced Photon Source, Argonne National Laboratory
    • Advance Photon Source-Argonne National Laboratory
  • Franz Himpsel

    • University of Wisconsin-Madison
  • Paul G. Evans

    • University of Wisconsin-Madison
    • University of Wisconsin-Madison Department of Materials Science and Engineering
    • University of Wisconsin-Madision