Invited Session: Advanced Characterization of Transistor Gate Stacks and Interfaces

Presentations

• Directions in High-k Gate Stacks: From Silicon Chips to Carbon Nanomaterials

  COFFEE_KLATCH · Invited

  Feb. 29, 2012, 2:30 PM – Feb. 29, 2012, 3:06 PM

  Authors

  • Matthew Copel

    • IBM

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• Nanometer-scale properties of metal/oxide interfaces and ``end-on'' metal contacts to Si nanowires studied by ballistic electron emission microscopy (BEEM)

  COFFEE_KLATCH · Invited

  Feb. 29, 2012, 3:06 PM – Feb. 29, 2012, 3:42 PM

  Authors

  • Jon Pelz

    • The Ohio State University, Dept. of Physics, Columbus, OH 43210

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• Metropolis Prize Talk: Defects in Al$_{2}$O$_{3}$ and their impact on III-V/Al$_{2}$O$_{3}$ MOS-based devices

  COFFEE_KLATCH · Invited

  Feb. 29, 2012, 3:42 PM – Feb. 29, 2012, 4:18 PM

  Authors

  • Justin R. Weber

    • Intel Corporation, Hillsboro, OR

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• Charge Traps at and near High-K Oxide/III-V Interfaces

  COFFEE_KLATCH · Invited

  Feb. 29, 2012, 4:18 PM – Feb. 29, 2012, 4:54 PM

  Authors

  • Paul McIntyre

    • Stanford University

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• Electrical characterization of interfacial defects

  COFFEE_KLATCH · Invited

  Feb. 29, 2012, 4:54 PM – Feb. 29, 2012, 5:30 PM

  Authors

  • Gennadi Bersuker

    • SEMATECH

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