Focus Session: Thin Film Block Copolymers - Phase Behavior
ORAL · H45 ·
Presentations
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Polymer Physics Prize Break
COFFEE_KLATCH
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Controlling the Orientation of Block Copolymer Thin Films with Selective and Neutral Nanoparticles
ORAL
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Authors
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Misang Yoo
- Korea University
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Seyong Kim
- Korea University
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Bumjoon J. Kim
- Korea Advanced Institute of Science and Technology
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Joona Bang
- Korea University
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Assembly and Photo-Induced Disorder in Block Copolymer-Additive Systems
ORAL
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Authors
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Li Yao
- University of Massachusetts Amherst
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James J. Watkins
- University of Massachusetts, Amherst
- Polymer Science and Engineering, UMASS Amherst
- University of Massachusetts
- University of Massachusetts Amherst
- University of Massachusetts Amherst, Polymer Science and Engineering Department
- University of Massachusetts Amherst Department of Polymer Science and Engineering
- Department of Polymer Science and Engineering, University of Massachusetts Amherst
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Diblock copolymer morphologies in ultra thin films under shear
ORAL
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Authors
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Marco Pinna
- University of Central Lancashire
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Andrei Zvelindovsky
- University of Central Lancashire
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Xiaohu Guo
- Daresbury Laboratory
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Christine Stokes
- University of Central Lancashire
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Structure and dynamics of random block copolymers in the bulk and thin films
ORAL
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Authors
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Marcus M{\"u}ller
- Georg-August Universit\"at
- Georg-August University, G\"ottingen, Germany
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Birger Steinm{\"u}ller
- Georg-August University, G\"ottingen, Germany
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Keith H. Hambrecht
- University of Utah, Salt Lake City
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Grant D. Smith
- University of Utah, Salt Lake City
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Dmitry Bedrov
- University of Utah, Salt Lake City
- Department of Materials Science and Engineering, University of Utah
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Macrophase Separation of Block Copolymer Blends in Thin Films
ORAL
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Authors
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Lance Williamson
- University of Wisconsin
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Paul Nealey
- University of Wisconsin-Madison
- Department of Chemical and Biological Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, USA
- University of Wisconsin
- University of Wisconsin, Madison
- University of Wisconsin - Madison
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Phase segregation at the sub-5-nm scale using high $\chi $ Poly(ethylene oxide-b-dimethylsiloxane) copolymers
ORAL
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Authors
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Damien Montarnal
- Materials Research Laboratory, UCSB
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Glenn Fredrickson
- Materials Research Laboratory, UCSB
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Edward J. Kramer
- University of California, Santa Barbara
- Departments of Materials and Chemical Engineering, UCSB, 93106-5050
- Departments of Materials and Chemical Engineering, UCSB
- Materials Research Laboratory, UCSB
- University of California Santa Barbara
- University of California - Santa Barbara
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Craig J. Hawker
- Materials Research Laboratory, UCSB
- University of California, Santa Barbara
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Decoupling Bulk Thermodynamics and Wetting Characteristics of Block Copolymer Thin Films
ORAL
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Authors
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Sangwon Kim
- University of Minnesota, Twin Cities
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Paul Nealey
- University of Wisconsin-Madison
- Department of Chemical and Biological Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, USA
- University of Wisconsin
- University of Wisconsin, Madison
- University of Wisconsin - Madison
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Frank Bates
- University of Minnesota
- Department of Chemical Engineering and Materials Science, University of Minnesota
- University of Minnesota, Twin Cities
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Continuity and connectivity of lamellar-forming block copolymers in thin films
ORAL
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Authors
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Ian Campbell
- University of Colorado, Boulder
- University of Colorado at Boulder
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Mark Stoykovich
- Department of Chemical and Biological Engineering, University of Colorado - Boulder
- University of Colorado
- University of Colorado, Boulder
- Department of Chemical \& Biochemical Engineering, University of Colorado at Boulder
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Theoretical and Experimental Investigations of Contact Hole Shrink using PS-PMMA Block Copolymers
ORAL
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Authors
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Valeriy Ginzburg
- The Dow Chemical Company
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Phillip Hustad
- The Dow Chemical Company
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Jeffrey Weinhold
- The Dow Chemical Company
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Rahul Sharma
- The Dow Chemical Company
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Vivian Chuang
- The Dow Chemical Company
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Peter Trefonas
- The Dow Chemical Company
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Tailoring block copolymer morphology via control of topographical surface: A self consistent field theoretic study
ORAL
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Authors
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Xianggui Ye
- Materials Research and Innovative Laboratory, Department of Chemical and Biomolecular Engineering, University of Tennessee, Knoxville, TN 37996
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Brian J. Edwards
- Materials Research and Innovative Laboratory, Department of Chemical and Biomolecular Engineering, University of Tennessee, Knoxville, TN 37996
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Bamin Khomami
- Materials Research and Innovative Laboratory, Department of Chemical and Biomolecular Engineering, University of Tennessee, Knoxville, TN 37996
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Silicon patterning using self-assembled PS-b-PAA diblock copolymer masks for anti-reflective black silicon fabrication via plasma etching
ORAL
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Authors
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Xin Zhang
- Department of Materials and Engineering, University of Maryland, College Park, MD 20742, USA
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Christopher J. Metting
- Department of Materials and Engineering, University of Maryland, College Park, MD 20742, USA
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Sean Fackler
- Department of Materials and Engineering, University of Maryland, College Park, MD 20742, USA
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Robert M. Briber
- University of Maryland
- Department of Materials and Engineering, University of Maryland, College Park, MD 20742, USA
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Andrei Sushkov
- Department of Physics, University of Maryland, College Park, MD 20742
- MRSEC and CNAM, Department of Physics, University of Maryland
- Department of Physics, University of Maryland, College Park, MD 20742, USA
- Center for Nanophysics and Advanced Materials, University of Maryland, College Park
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Dennis Drew
- Department of Physics, University of Maryland, College Park, MD 20742
- Department of Physics, University of Maryland, College Park, MD 20742, USA
- Physics department, University of Maryland
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Assembly of block copolymer films between chemically patterned and chemically homogeneous surface
ORAL
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Authors
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Jeong In Lee
- University of Wisconsin
- University of Wisconsin - Madison
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Huiman Kang
- University of Wisconsin
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Hyo Seon Suh
- University of Wisconsin
- University of Wisconsin - Madison
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Christopher Thode
- University of Wisconsin
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Lei Wan
- HGST
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Abelrado Hernandez
- University of Wisconsin
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Yasuhiko Tada
- Hitachi Ltd.
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Hiroshi Yoshida
- Hitachi Ltd.
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Juan J. de Pablo
- University of Wisconsin-Madison
- Department of Chemical and Biological Engineering, University of Wisconsin--Madison
- University of Wisconsin
- Department of Chemical and Biological Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, USA
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Paul Nealey
- University of Wisconsin-Madison
- Department of Chemical and Biological Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, USA
- University of Wisconsin
- University of Wisconsin, Madison
- University of Wisconsin - Madison
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