Focus Session: Dielectric, Ferroelectric, and Piezoelectric Oxides - Conducting Domain Walls and Conduction Mechanisms
ORAL · H32 ·
Presentations
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Conduction of topologically-protected charged ferroelectric domain walls
ORAL
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Authors
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Weida Wu
- Department of Physics and Astronomy and Rutgers Center for Emergent Materials, Rutgers University, Piscataway, New Jersey 08854, USA
- Department of Physics and Astronomy and Rutgers Center for emergent materials, Rutgers University, Piscataway, NJ 08854 USA
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Yoichi Horibe
- Rutgers Center for Emergent Materials and Department of Physics and Astronomy, Rutgers University, Piscataway, New Jersey 08854, USA
- Department of Physics and Astronomy and Rutgers Center for emergent materials, Rutgers University, Piscataway, NJ 08854 USA
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Nara Lee
- Department of Physics and Astronomy and Rutgers Center for Emergent Materials, Rutgers University, Piscataway, New Jersey 08854, USA
- Rutgers Center for Emergent Materials and Department of Physics and Astronomy, Rutgers University, Piscataway, New Jersey 08854, USA
- Rutgers University
- Rutgers Center for Emergent Materials and Department of Physics and Astronomy, Rutgers University
- Rutgers Center for Emergent Materials and Dept of Phys and Astronomy, Rutgers U., NJ, USA
- Department of Physics and Astronomy and Rutgers Center for emergent materials, Rutgers University, Piscataway, NJ 08854 USA
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S-W. Cheong
- Rutgers Center for Emergent Materials
- Rutgers University
- Department of Physics and Astronomy and Rutgers Center for Emergent Materials, Rutgers University, Piscataway, New Jersey 08854, USA
- Rutgers Center for Emergent Materials and Department of Physics and Astronomy, Rutgers University, Piscataway, New Jersey 08854, USA
- Rutgers Center for Emergent Materials and Department of Physics and Astronomy, Rutgers University
- Rutgers Center for Emergent Materials and Dept of Phys and Astronomy, Rutgers U., NJ, USA
- Department of Physics and Astronomy and Rutgers Center for emergent materials, Rutgers University, Piscataway, NJ 08854 USA
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Jeffery Guest
- Center for Nanoscale Materials, Argonne National Laboratory, Argonne, IL 60439, USA
- Center for Nanoscale Materials, Argonne National Laboratory
- Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439 USA
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Electrical dressing of domain walls in hexagonal ErMnO$_3$
ORAL
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Authors
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Dennis Meier
- UC Berkeley
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Jan Seidel
- UC Berkeley
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Andres Cano
- European Synchrotron Radiation Facility
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Kris Delaney
- UC Santa Barbara
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Yu Kumagai
- ETH Zuerich
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Maxim Mostovoy
- University of Groningen
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Nicola A. Spaldin
- ETH Zuerich
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Manfred Fiebig
- ETH Zuerich
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Ramamoorthy Ramesh
- UC Berkeley
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Anisotropic conductance at improper ferroelectric domain walls
ORAL
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Authors
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Jan Seidel
- Department of Materials Science and Engineering, University of California, Berkeley, CA 94720, USA
- Department of Materials, ETH Zurich, Wolfgang-Pauli-Strasse, 8093 Zurich, Switzerland
- Zernike Institute for Advanced Materials, University of Groningen, 9747 AG Groningen, The Netherlands
- Materials Research Laboratory, University of California, Santa Barbara, CA 93106, USA
- European Synchrotron Radiation Facility, 6 Rue Jules Horowitz, 38043 Grenoble, France
- Department of Physics, University of California, Berkeley, CA 94720, USA
- Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA
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Jan Seidel
- Department of Materials Science and Engineering, University of California, Berkeley, CA 94720, USA
- Department of Materials, ETH Zurich, Wolfgang-Pauli-Strasse, 8093 Zurich, Switzerland
- Zernike Institute for Advanced Materials, University of Groningen, 9747 AG Groningen, The Netherlands
- Materials Research Laboratory, University of California, Santa Barbara, CA 93106, USA
- European Synchrotron Radiation Facility, 6 Rue Jules Horowitz, 38043 Grenoble, France
- Department of Physics, University of California, Berkeley, CA 94720, USA
- Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA
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Jan Seidel
- Department of Materials Science and Engineering, University of California, Berkeley, CA 94720, USA
- Department of Materials, ETH Zurich, Wolfgang-Pauli-Strasse, 8093 Zurich, Switzerland
- Zernike Institute for Advanced Materials, University of Groningen, 9747 AG Groningen, The Netherlands
- Materials Research Laboratory, University of California, Santa Barbara, CA 93106, USA
- European Synchrotron Radiation Facility, 6 Rue Jules Horowitz, 38043 Grenoble, France
- Department of Physics, University of California, Berkeley, CA 94720, USA
- Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA
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Jan Seidel
- Department of Materials Science and Engineering, University of California, Berkeley, CA 94720, USA
- Department of Materials, ETH Zurich, Wolfgang-Pauli-Strasse, 8093 Zurich, Switzerland
- Zernike Institute for Advanced Materials, University of Groningen, 9747 AG Groningen, The Netherlands
- Materials Research Laboratory, University of California, Santa Barbara, CA 93106, USA
- European Synchrotron Radiation Facility, 6 Rue Jules Horowitz, 38043 Grenoble, France
- Department of Physics, University of California, Berkeley, CA 94720, USA
- Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA
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Jan Seidel
- Department of Materials Science and Engineering, University of California, Berkeley, CA 94720, USA
- Department of Materials, ETH Zurich, Wolfgang-Pauli-Strasse, 8093 Zurich, Switzerland
- Zernike Institute for Advanced Materials, University of Groningen, 9747 AG Groningen, The Netherlands
- Materials Research Laboratory, University of California, Santa Barbara, CA 93106, USA
- European Synchrotron Radiation Facility, 6 Rue Jules Horowitz, 38043 Grenoble, France
- Department of Physics, University of California, Berkeley, CA 94720, USA
- Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA
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Jan Seidel
- Department of Materials Science and Engineering, University of California, Berkeley, CA 94720, USA
- Department of Materials, ETH Zurich, Wolfgang-Pauli-Strasse, 8093 Zurich, Switzerland
- Zernike Institute for Advanced Materials, University of Groningen, 9747 AG Groningen, The Netherlands
- Materials Research Laboratory, University of California, Santa Barbara, CA 93106, USA
- European Synchrotron Radiation Facility, 6 Rue Jules Horowitz, 38043 Grenoble, France
- Department of Physics, University of California, Berkeley, CA 94720, USA
- Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA
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Jan Seidel
- Department of Materials Science and Engineering, University of California, Berkeley, CA 94720, USA
- Department of Materials, ETH Zurich, Wolfgang-Pauli-Strasse, 8093 Zurich, Switzerland
- Zernike Institute for Advanced Materials, University of Groningen, 9747 AG Groningen, The Netherlands
- Materials Research Laboratory, University of California, Santa Barbara, CA 93106, USA
- European Synchrotron Radiation Facility, 6 Rue Jules Horowitz, 38043 Grenoble, France
- Department of Physics, University of California, Berkeley, CA 94720, USA
- Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA
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Jan Seidel
- Department of Materials Science and Engineering, University of California, Berkeley, CA 94720, USA
- Department of Materials, ETH Zurich, Wolfgang-Pauli-Strasse, 8093 Zurich, Switzerland
- Zernike Institute for Advanced Materials, University of Groningen, 9747 AG Groningen, The Netherlands
- Materials Research Laboratory, University of California, Santa Barbara, CA 93106, USA
- European Synchrotron Radiation Facility, 6 Rue Jules Horowitz, 38043 Grenoble, France
- Department of Physics, University of California, Berkeley, CA 94720, USA
- Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA
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Jan Seidel
- Department of Materials Science and Engineering, University of California, Berkeley, CA 94720, USA
- Department of Materials, ETH Zurich, Wolfgang-Pauli-Strasse, 8093 Zurich, Switzerland
- Zernike Institute for Advanced Materials, University of Groningen, 9747 AG Groningen, The Netherlands
- Materials Research Laboratory, University of California, Santa Barbara, CA 93106, USA
- European Synchrotron Radiation Facility, 6 Rue Jules Horowitz, 38043 Grenoble, France
- Department of Physics, University of California, Berkeley, CA 94720, USA
- Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA
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Conduction at domain walls in insulating Pb(Zr$_{0.2}$Ti$_{0.8}$)O$_3$ thin films
ORAL
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Authors
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Jill Guyonnet
- DPMC, University of Geneva
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Iaroslav Gaponenko
- DPMC, University of Geneva
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Stefano Gariglio
- DPMC, University of Geneva
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Patrycja Paruch
- DPMC, University of Geneva
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Interplay between polarization and conductivity in BiFeO$_{3}$ thin films
ORAL
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Authors
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Saeedeh Farokhipoor
- Zernike Institute for Advanced Materials, Netherlands
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Beatriz Noheda Pinuaga
- Zernike Institute for Advanced Materials, Netherlands
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Tunable Metallic Conductivity in Ferroelectric Nanodomains
ORAL
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Authors
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P. Maksymovych
- Center of Nanophase Materials Sciences, Oak Ridge National Laboratory, TN, USA 37831
- Oak Ridge National Laboratory
- Oak Ridge National Laboratory, Oak Ridge, TN
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A.N. Morozovska
- Institute for Semiconductor Physics, National Academy of Science of Ukraine
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Pu Yu
- Department of Materials Science and Engineering , University of California, Berkeley, CA
- University of California,Berkeley / Lawrence Berkeley National Lab
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E.A. Eliseev
- Institute for Problems of Materials Science, National Academy of Science of Ukraine
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Y.-H. Chu
- Department of Materials Science and Engineering, National Chiao Tung University
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R. Ramesh
- Department of Materials Science and Engineering, University of California, Berkeley, CA
- US DOE / UC Berkeley
- University of California,Berkeley / Lawrence Berkeley National Lab
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A.P. Baddorf
- Oak Ridge National Laboratory
- Oak Ridge National Laboratory, Oak Ridge, TN
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S.V. Kalinin
- Oak Ridge National Laboratory
- Oak Ridge National Laboratory, Oak Ridge, TN
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Ultrafast p-d charge-transfer carrier dynamics of multiferroic BiFeO3
ORAL
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Authors
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Y.M. Sheu
- Center for Integrated Nanotechnologies, LANL, Los Alamos, NM 87545
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S.A. Trugman
- Center for Integrated Nanotechnologies, LANL, Los Alamos, NM 87545
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Y.-S. Park
- Center for Integrated Nanotechnologies, LANL, Los Alamos, NM 87545
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S.-W. Cheong
- Department of Physics and Astronomy, Rutgers University, NJ 08854
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Q. Jia
- Center for Integrated Nanotechnologies, LANL, Los Alamos, NM 87545
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A.J. Taylor
- Center for Integrated Nanotechnologies, LANL, Los Alamos, NM 87545
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R.P. Prasankumar
- Center for Integrated Nanotechnologies, LANL, Los Alamos, NM 87545
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Photocurrent effect of epitaxial tetragonal-like BiFeO$_{3}$ thin film
ORAL
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Authors
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Kanghyun Chu
- Department of Physics, KAIST
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Chang-Su Woo
- Department of Physics, KAIST
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Seung Jin Kim
- Department of Physics, KAIST
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Ji Ho Sung
- Department of Materials Science and Engineering, POSTECH
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Wonmo Lee
- Department of Materials Science and Engineering, POSTECH
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Moon-Ho Jo
- Department of Materials Science and Engineering, POSTECH
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Chan-Ho Yang
- Department of Physics, KAIST
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Intrinsic defects in BiFeO3: Energetics and implication for magetism
ORAL
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Authors
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Tula R. Paudel
- University of Nebraska, Lincoln
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Sitaram S. Jaswal
- University of Nebraska - Lincoln
- University of Nebraska, Lincoln
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Evgeny Tsymbal
- University of Nebraska, Lincoln
- Department of Physics and Astronomy, University of Nebraska-Lincoln
- University of Nebraska - Lincoln
- Department of Physics and Astronomy,University of Nebraska-Lincoln
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Dielectric screening enhanced Hall mobility in doped ferroelectrics
ORAL
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Authors
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Wolter Siemons
- Oak Ridge National Laboratory
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Michael A. McGuire
- Oak Ridge National Laboratory
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Valentino R. Cooper
- Oak Ridge National Laboratory
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Michael D. Biegalski
- Oak Ridge National Laboratory
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Ilia N. Ivanov
- Oak Ridge National Laboratory
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Gerald E. Jellison
- Oak Ridge National Laboratory
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Lynn A. Boatner
- Oak Ridge National Laboratory
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Brian C. Sales
- Oak Ridge National Laboratory
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Hans M. Christen
- Oak Ridge National Laboratory
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The persistence of ferroelectric distortions in electron-doped BaTiO3: microscopic origins and critical behavior
ORAL
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Authors
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Yong Wang
- University of Nebraska - Lincoln
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J.D. Burton
- University of Nebraska
- University of Nebraska, Lincoln
- University of Nebraska - Lincoln, Nebraska Center for Materials and Nanoscience
- University of Nebraska - Lincoln
- Department of Physics and Astronomy,University of Nebraska-Lincoln
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Sitaram S. Jaswal
- University of Nebraska - Lincoln
- University of Nebraska, Lincoln
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Evgeny Tsymbal
- University of Nebraska, Lincoln
- Department of Physics and Astronomy, University of Nebraska-Lincoln
- University of Nebraska - Lincoln
- Department of Physics and Astronomy,University of Nebraska-Lincoln
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Multiphysics model of semiconducting ferroelectrics and its application to memory devices
ORAL
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Authors
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Nathaniel Ng
- California Institute of Technology
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Kaushik Bhattacharya
- California Institute of Technology
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Conduction mechanism in BiFeO$_{3}$-CoFe$_{2}$O$_{4}$ columnar nanostructure
ORAL
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Authors
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Yi-Chun Chen
- Department of Physics, National Cheng-Kung University, Tainan, Taiwan
- Department of Physics, National Cheng Kung University
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Ying-Hui Heish
- Department of Materials Science and Engineering, National Chiao Tung University
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Chen-Wei Liang
- Department of Materials Science and Engineering, National Chiao Tung University
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Jia-Ming Liou
- Department of Physics, National Cheng Kung University
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Ya-Ping Chiu
- Department of Physics, National Sun Yat-Sen University
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Qing He
- Advanced Light Source, Lawrence Berkeley National Laboratory
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Qian Zhan
- Department of Materials Physics and Chemistry, University of Science and Technology Beijing
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Ying-Hao Chu
- Department of Materials Science and Engineering, National Chiao Tung University
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Current-Controlled Negative Differential Resistance Due to Joule Heating In Tio$_2$
ORAL
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Authors
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A.M. Bratkovsky
- Hewlett-Packard Laboratories, Palo Alto
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A.S. Alexandrov
- Loughborough Inst. Technology, UK
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S.E. Savel'ev
- Loughborough Inst. Technology, UK
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D.B. Strukov
- UC Santa Barbara, Santa Barbara
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R.S. Williams
- Hewlett-Packard Laboratories, Palo Alto
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Physical and Electrical Characterization of HfO$_{2}$, HfSiO$_{4}$, and ZrSiO$_{4}$ Memristors Based on Sol-Gel Synthesis
ORAL
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Authors
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J.L. Tedesco
- National Institute of Standards and Technology
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Walter Zheng
- National Institute of Standards and Technology
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S. Pookpanratana
- National Institute of Standards and Technology
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A.A. Herzing
- NIST
- National Institute of Standards and Technology
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P.P. Kavuri
- National Institute of Standards and Technology
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O.A. Kirillov
- Semiconductor and Dimensional Metrology Div, NIST Gaithersburg, MD
- National Institute of Standards and Technology
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N.V. Nguyen
- National Institute of Standards and Technology
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Curt Richter
- Semiconductor and Dimensional Metrology Div., NIST
- Semiconductor and Dimensional Metrology Div, NIST Gaithersburg, MD
- National Institute of Standards and Technology
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