Invited Session: Industrial Applications of Advanced Polymer-Based Nanomaterials

Presentations

• Polymer and Material Design for Lithography From 50 nm Node to the sub-16 nm Node

  COFFEE_KLATCH · Invited

  Feb. 27, 2012, 11:15 AM – Feb. 27, 2012, 11:51 AM

  Authors

  • Peter Trefonas

    • The Dow Chemical Company

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• Development of nanostructured surfaces for ice protection applications

  COFFEE_KLATCH · Invited

  Feb. 27, 2012, 11:51 AM – Feb. 27, 2012, 12:27 PM

  Authors

  • Azar Alizadeh

    • GE Global Research

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• Tough Block Copolymer Organogels and Elastomers as Short Fiber Composites

  COFFEE_KLATCH · Invited

  Feb. 27, 2012, 12:27 PM – Feb. 27, 2012, 1:03 PM

  Authors

  • Edward J. Kramer

    • University of California, Santa Barbara
    • Departments of Materials and Chemical Engineering, UCSB, 93106-5050
    • Departments of Materials and Chemical Engineering, UCSB
    • Materials Research Laboratory, UCSB
    • University of California Santa Barbara
    • University of California - Santa Barbara

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• Interfacial, Thin Film, and Structural Measurements to Facilitate Polymer Nanomanufacturing

  COFFEE_KLATCH · Invited

  Feb. 27, 2012, 1:03 PM – Feb. 27, 2012, 1:39 PM

  Authors

  • Christopher Soles

    • NIST Polymers Division

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• Self-Healing Polymer Networks

  COFFEE_KLATCH · Invited

  Feb. 27, 2012, 1:39 PM – Feb. 27, 2012, 2:15 PM

  Authors

  • Francois Tournilhac

    • Ecole Superieure de Physique et Chimie Industrielles (Paris)

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