Focus Session: Thin Film Block Copolymers - Swelling and Ordering
ORAL · B45 ·
Presentations
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ABSTRACT WITHDRAWN
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Effect of Solvent Removal Rate on the Morphology of Solvent Vapor Annealed ABA Triblock Copolymer Thin Films
ORAL
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Authors
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Julie N. L. Albert
- University of Delaware
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Wen-Shiue Young
- University of Delaware
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Ronald L. Lewis, III
- University of Delaware
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Timothy D. Bogart
- University of Delaware
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Jasmine R. Smith
- University of Delaware
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Thomas Epps
- University of Delaware
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Obtaining Perpendicular Block Copolymer Morphologies with Solvent Annealing
ORAL
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Authors
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Kevin W. Gotrik
- Massachusetts Institute of Technology
- MIT, Dept. of Materials Science and Engineering
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Jeong Gon Son
- Massachusetts Institute of Technology
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Adam F. Hannon
- MIT
- Massachusetts Institute of Technology
- MIT, Dept. of Materials Science and Engineering
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Caroline A. Ross
- Massachusetts Institute of Technology
- MIT
- MIT, Dept. of Materials Science and Engineering
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Mesoscale Dynamics of Solvent Evaporation in Block Copolymer Thin Films
ORAL
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Authors
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Sean Paradiso
- University of California, Santa Barbara
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Su-mi Hur
- University of California, Santa Barbara
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Kris Delaney
- UC Santa Barbara
- University of California, Santa Barbara
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Hector Ceniceros
- University of California, Santa Barbara
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Carlos Garcia-Cervera
- University of California, Santa Barbara
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Glenn Fredrickson
- University of California, Santa Barbara
- Department of Chemical Engineering, UCSB
- University of California Santa Barbara
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Optimizing the Combination of Solvent Annealing and Directed Self-Assembly in Thin Film Block Copolymer Systems Using Self-Consistent Field Theory
ORAL
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Authors
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Adam F. Hannon
- MIT
- Massachusetts Institute of Technology
- MIT, Dept. of Materials Science and Engineering
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Kevin W. Gotrik
- Massachusetts Institute of Technology
- MIT, Dept. of Materials Science and Engineering
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Alfredo Alexander-Katz
- Massachusetts Institute of Technology
- MIT
- MIT, Dept. of Materials Science and Engineering
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Caroline A. Ross
- Massachusetts Institute of Technology
- MIT
- MIT, Dept. of Materials Science and Engineering
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Sub-10 nm block copolymer patterns with mixed morphology and period using electron irradiation and solvent annealing
ORAL
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Authors
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Jeong Gon Son
- Korea Institute of Science and Technology
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Jae-Byum Chang
- MIT
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Karl K. Berggren
- MIT
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Caroline A. Ross
- Massachusetts Institute of Technology
- MIT
- MIT, Dept. of Materials Science and Engineering
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Raster solvent vapor annealing of block copolymer thin films
ORAL
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Authors
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Jonathan Seppala
- University of Delaware
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Ronald L. Lewis, III
- University of Delaware
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Thomas Epps
- University of Delaware
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Confined drying of copolymer solutions
ORAL
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Authors
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Daubersies Laure
- None
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Leng Jacques
- None
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Salmon Jean-Baptiste
- None
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Rapid Self- Assembly and Perpendicular Alignment in lamellar PS-b-PEO System for Fabrication of Sub 20 nm Nanolithography Templates
ORAL
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Authors
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Parvaneh Mokarian-Tabari
- University College Cork and Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Ireland
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Timothy W. Collins
- University College Cork and Tyndall National Institute
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Ramsankar Senthamaraikannan
- University College Cork and Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Ireland
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Justin D. Holmes
- University College Cork and Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Ireland
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Michael A. Morris
- University College Cork and Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Ireland
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Controlled Deposition of Ordered Block Copolymer Thin Films by Electrospray
ORAL
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Authors
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Hanqiong Hu
- Department of Chemical Engineering, Yale University
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Sofia Rangou
- Department of Materials Science and Engineering, University of Ioannina, Greece
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Apostolos Avergopoulos
- Department of Materials Science and Engineering, University of Ioannina, Greece
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Chinedum Osuji
- Department of Chemical Engineering, Yale University
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Two distinct timescales in the ordering of symmetric diblock copolymer films
ORAL
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Authors
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Robert D. Peters
- Department of Physics \& Astronomy and the Brockhouse Institute for Materials Research, McMaster University, Hamilton, ON, Canada, L8S 4M1
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Kari Dalnoki-Veress
- Department of Physics \& Astronomy and the Brockhouse Institute for Materials Research, McMaster University, Hamilton, ON, Canada, L8S 4M1
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The hydration and ordering of lamellar block copolymer films prior to the formation of polymer vesicles
ORAL
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Authors
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Yohei Kamata
- Kuraray Co., Ltd.
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Andrew Parnell
- Department of Physics and Astronomy, University of Sheffield
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Andrew Dennison
- Institut Laue-Langevin
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Robert Barker
- Institut Laue-Langevin
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Philipp Gutfreund
- Institut Laue-Langevin
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Maximilian Skoda
- ISIS, STFC, Rutherford-Appleton Lab
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Shaomin Mai
- Department of Chemistry, University of Sheffield
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Richard Jones
- Department of Physics and Astronomy, University of Sheffield
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Effect of thickness on microdomain orientation in shear-aligned, cylinder-forming PS-PHMA thin films
ORAL
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Authors
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Raleigh Davis
- Princeton University
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Paul Chaikin
- New York University Center for Soft Matter Research
- Department of Physics, New York University
- New York University
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Richard Register
- Princeton University
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GISAXS simulation and analysis on GPU clusters
ORAL
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Authors
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Slim Chourou
- Lawrence Berkeley National Laboratory
- Computational Research Division, Lawrence Berkeley National Laboratory
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Abhinav Sarje
- Lawrence Berkeley National Laboratory
- Computational Research Division, Lawrence Berkeley National Laboratory
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Xiaoye Li
- Computational Research Division, Lawrence Berkeley National Laboratory
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Elaine Chan
- Advanced Light Source, Lawrence Berkeley National Laboratory
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Alexander Hexemer
- Lawerence Berkeley National Laboratory
- LBNL
- Lawrence Berkeley National Laboratory
- Advanced Light Source, Lawrence Berkeley National Laboratory
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Modeling Line Edge Roughness in Lamellar Block Copolymer Systems
ORAL
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Authors
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Paul Patrone
- University of Maryland, College Park; and NIST Gaithersburg
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Gregg Gallatin
- NIST Gaithersburg
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