Block copolymer thin films with long-range lateral order

ORAL

Abstract

We investigated thin block copolymer films on silicon wafers as well as faceted surfaces of sapphire. Thin films were prepared by spin-coating block copolymer solutions on the corresponding substrates. Subsequent annealing in organic solvent vapors served as a means to induce lateral long-range order in the thin films. The resulting block copolymer structures were analyzed by AFM and GISAXS.

–

Authors

  • Ilja Gunkel

    • Lawrence Berkeley National Laboratory

  • Ting Xu

    • University of California, Berkeley

  • Alexander Hexemer

    • Lawrence Berkeley National Laboratory

  • Thomas Russell

    • University of Massachusetts, Amherst