Quantum lithography beyond the diffraction limit via Rabi-oscillations

ORAL

Abstract

We propose a quantum optical method to do the sub-wavelength lithography. Our method is similar to the traditional lithography but adding a critical step before dissociating the chemical bound of the photoresist. The subwavelength pattern is achieved by inducing the multi-Rabi-oscillation between the two atomic levels. The proposed method does not require multiphoton absorption and the entanglement of photons. This method is expected to be realizable using current technology.

*This work is supported by a grant from the Qatar National Research Fund (QNRF) under the NPRP project and a grant from the King Abdulaziz City for Science and Technology (KACST).

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Authors

  • Zeyang Liao

    • Institute for Quantum Studies and Department of Physics and Astronomy, Texas A\&M University, College Station, TX 77843-4242, USA

  • Mohammad Al-Amri

    • The National Center for Mathematics and Physics, KACST, P.O.Box 6086, Riyadh 11442, Saudi Arabia

  • M. Suhail Zubairy

    • Institute for Quantum Studies and Department of Physics and Astronomy, Texas A\&M University, College Station, TX 77843-4242, USA