Prediction of a Low Band Gap Oxide Ferroelectric

ORAL

Abstract

We report a first principles study of Bi$_6$Ti$_4$O$_{17}$ which is an alternate stacking of ferroelectric Bi$_4$Ti$_3$O$_{12}$ (BiT). We the standard PBE GGA functional for the structure and polarization and a recently developed functional that yields accurate band gaps for the electronic structure. We find that this compound is ferroelectric although with a reduced polarization relative to BiT. Importantly, calculations of the electronic structure yield a band gap of approximately 1.4 eV. Therefore, we predict that this stacking is a low band gap oxide ferroelectric.

*This work was supported by A*STAR (BX,YPF), the DOE, BES, Materials Sciences and Engineering (DJS,VRC, Ferroelectricity), and the ORNL LDRD Program (DJS, Electronic Structure).

Authors

  • David Singh

    • Oak Ridge National Laboratory
    • ORNL
    • Oak Ridge National Lab
  • Bo Xu

    • National University of Singapore
  • Valentino R. Cooper

    • ORNL
  • Yuan Ping Feng

    • National University of Singapore