Focus Session: Dopants and Defects in Semiconductors: Silicon

FOCUS · H12 ·






Presentations

  • ORAL

    Authors

    • Gernot Pfanner

      • Max-Planck-Institut fuer Eisenforschung, Duesseldorf, Germany
    • Christoph Freysoldt

      • Max-Planck-Institut fuer Eisenforschung, Duesseldorf, Germany
      • MPIE D\"usseldorf
    • Joerg Neugebauer

      • Max-Planck-Institut fuer Eisenforschung, Duesseldorf, Germany
      • MPIE D\"usseldorf
      • Dept. for Computational Materials Design, Max-Planck-Institut fuer Eisenforschung GmbH, Duesseldorf, Germany

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  • ORAL

    Authors

    • Felix Hoehne

      • Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, 85748 Garching, Germany
    • Lukas Dreher

      • Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, 85748 Garching, Germany
    • Hans Huebl

      • Walther-Meissner-Institut, Bayerische Akademie der Wissenschaften, Walther-Meissner-Strasse 8, 85748 Garching, Germany
    • Martin Stutzmann

      • Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, 85748 Garching, Germany
    • Martin S. Brandt

      • Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, 85748 Garching, Germany

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  • ORAL

    Authors

    • Lukas Dreher

      • Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, 85748 Garching, Germany
    • Timon A. Hilker

      • Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, 85748 Garching, Germany
    • Andreas Brandlmaier

      • Walther-Meissner-Institut, Bayerische Akademie der Wissenschaften, Walther-Meissner-Strasse 8, 85748 Garching, Germany
    • Sebastian T.B. Goennenwein

      • Walther-Meissner-Institut, Bayerische Akademie der Wissenschaften, Walther-Meissner-Strasse 8, 85748 Garching, Germany
    • Hans Huebl

      • Walther-Meissner-Institut, Bayerische Akademie der Wissenschaften, Walther-Meissner-Strasse 8, 85748 Garching, Germany
    • Martin Stutzmann

      • Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, 85748 Garching, Germany
    • Martin S. Brandt

      • Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, 85748 Garching, Germany

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  • ORAL

    Authors

    • Philipp Studer

      • London Ctr. Nanotech. and Dept. Electron. \& Elec., UCL, London, UK
      • UCL, UK
    • Cyrus F. Hirjibehedin

      • UCL, UK
      • London Ctr. Nanotech., Dept. Phys. \& Astron. and Dept. Chem., UCL, London, UK
    • Steven R. Schofield

      • London Ctr. Nanotech. and Dept. Phys. \& Astron., UCL, London, UK
      • UCL, UK
    • Veronika Brazdova

      • UCL, UK
    • David R. Bowler

      • University College London and London Centre for Nanotechnology
      • London Ctr. Nanotech. and Dept. Phys. \& Astron., UCL, London, UK
      • UCL, UK
      • University College London/London Centre for Nanotechnology, UK
    • Neil J. Curson

      • London Ctr. Nanotech. and Dept. Electron. \& Elec., UCL, London, UK
      • UCL, UK

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  • ORAL

    Authors

    • Gaigong Zhang

      • UC Davis
    • Andrew Canning

      • Lawrence Berkeley National Laboratory, UC Davis
      • UC Davis/ LBNL
    • Niels Jensen

      • UC Davis/ LBNL
    • Stephen Derenzo

      • LBNL
    • Lin-Wang Wang

      • Lawrence Berkeley National Laboratory
      • Lawrence Berkeley National Labortaory
      • Material Sciences Division
      • Lawrence Berkeley National Lab
      • LBNL

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  • ORAL

    Authors

    • Brad D. Malone

      • Department of Physics, University of California, Berkeley, and Materials Science Division, Lawrence Berkeley National Laboratory
    • Marvin L. Cohen

      • University of California at Berkeley and Lawrence Berkeley National Laboratory
      • University of California, Berkeley
      • University of California Berkeley
      • University of California at Berkeley and Lawrence Berkeley National Lab
      • Department of Physics, University of California, Berkeley, and Materials Science Division, Lawrence Berkeley National Laboratory

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  • ORAL

    Authors

    • Neil J. Curson

      • London Ctr. Nanotech. and Dept. Electron. \& Elec., UCL, London, UK
      • UCL, UK
    • Philipp Studer

      • London Ctr. Nanotech. and Dept. Electron. \& Elec., UCL, London, UK
      • UCL, UK
    • Steven R. Schofield

      • UCL, UK
    • Greg Lever

      • UCL, UK
    • David R. Bowler

      • University College London and London Centre for Nanotechnology
      • London Ctr. Nanotech. and Dept. Phys. \& Astron., UCL, London, UK
      • UCL, UK
      • University College London/London Centre for Nanotechnology, UK
    • Cyrus F. Hirjibehedin

      • UCL, UK
      • London Ctr. Nanotech., Dept. Phys. \& Astron. and Dept. Chem., UCL, London, UK

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  • ORAL

    Authors

    • Steven R. Schofield

      • London Ctr. Nanotech. and Dept. Phys. \& Astron., UCL, London, UK
      • UCL, UK
    • Philipp Studer

      • London Ctr. Nanotech. and Dept. Electron. \& Elec., UCL, London, UK
      • UCL, UK
    • Cyrus F. Hirjibehedin

      • UCL, UK
      • London Ctr. Nanotech., Dept. Phys. \& Astron. and Dept. Chem., UCL, London, UK
    • Neil J. Curson

      • London Ctr. Nanotech. and Dept. Electron. \& Elec., UCL, London, UK
      • UCL, UK
    • Gabriel Aeppli

      • London Ctr. Nanotech. and Dept. Phys. \& Astron., UCL, London, UK
    • David R. Bowler

      • University College London and London Centre for Nanotechnology
      • London Ctr. Nanotech. and Dept. Phys. \& Astron., UCL, London, UK
      • UCL, UK
      • University College London/London Centre for Nanotechnology, UK

    View abstract →