Structure and transport of LaFeO$_{3}$ - Sm$_{2}$CuO$_{4}$ superlattices

ORAL

Abstract

When materials with different work functions are stacked to form a superlattice, charge transfer occurs until the electrostatic potential due to charge build up compensates the difference in work functions. This interfacial charge transfer process is a new route to dope materials. We have grown fully epitaxial superlattices consisting of Sm$_{2}$CuO$_{4}$ (SCO), the parent compound of the electron doped superconducting cuprates, and LaFeO$_{3}$ (LFO) an antiferromagnetic insulator. A detailed structural characterization by means of x-ray diffraction, scanning transmission electron microscopy, and atomic force microscopy, demonstrates the high structural quality of our samples. We will show electronic transport measurements of the superlattices, and SCO and LFO individual thin films supporting the possibility of electron doping the Sm$_{2}$CuO$_{4}$ in these samples.

*Work at UCM supported by MAT2008 06517, at ORNL supported by the Division of Materials Sciences and Engineering of the US DOE.

Authors

  • F.Y. Bruno

    • GFMC, Universidad Complutense de Madrid, Madrid 28040, Spain
  • A. Rivera-Calzada

    • GFMC, Universidad Complutense de Madrid, Madrid 28040, Spain
  • C. Leon

    • GFMC, Universidad Complutense de Madrid, Madrid 28040, Spain
  • J. Garcia-Barriocanal

    • European Synchrotron Radiation Facility, Grenoble 38043, France
  • M. Varela

    • Oak Ridge National Laboratory, Oak Ridge TN 37831
    • Materials Science \& Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA
    • Oak Ridge National Laboratory
    • Oak Ridge Natl. Lab.
  • S. J. Pennycook

    • Oak Ridge National Laboratory
    • Oak Ridge National Laboratory, Oak Ridge TN 37831
    • Materials Science \& Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA
    • Oak Ridge Natl. Lab.
  • J. Santamaria

    • Universidad Complutense de Madrid
    • GFMC, Universidad Complutense de Madrid, Madrid 28040, Spain
    • Universidad Complutense de Madrid, Spain