Resonant Anomalous Synchrotron X-Ray Studies of LaAlO$_{3}$ Films on SrTiO$_{3}$(001)

ORAL

Abstract

The high conductivity present at the interface between LaAlO$_{3}$ and TiO$_{2}$-terminated SrTiO$_{3}$(001) has been attributed to an electronic reconstruction [1] or atomic intermixing [2], both induced by the polar discontinuity. LaAlO$_{3}$ films with thicknesses equal to or thinner than a critical thickness (three unit cells [3]), however, can maintain the interface dipole, and no reconstruction (electronic or atomic) is expected. In this study, we employ resonant anomalous x-ray scattering at the Ti K-edge to investigate the structure and properties of the LaAlO$_{3}$ films both above and below the critical thickness. For films thicker than the critical thickness, an interfacial layer is observed to form. The structure and chemical properties of the interfacial layer as determined by both resonant scattering and x-ray spectroscopy will be discussed.

*This work is supported by the U.S. Department of Energy under Contract No. DE-AC02-06CH11357.

Authors

  • Dillon Fong

    • Argonne National Laboratory
    • Materials Science Division, Argonne National Laboratory
  • Tim Fister

    • Argonne National Laboratory
    • Materials Science Division, Argonne National Laboratory
  • Marie-Ingrid Richard

    • Argonne National Laboratory
  • Stephan Hruszkewycz

    • Argonne National Laboratory
  • Jeffrey Eastman

    • Argonne National Laboratory
    • Materials Science Division, Argonne National Laboratory
  • Paul Fuoss

    • Argonne National Laboratory
    • Materials Science Division, Argonne National Laboratory
  • Sung Seok Seo

    • Oak Ridge National Laboratory
  • H.N. Lee

    • Oak Ridge National Laboratory
    • Oak Ridge Natl. Lab.