Control self-assembled nanowire using chemically modified substrates

POSTER

Abstract

Block copolymer lithography is a promising method for fabricating periodical nanopatterns. Strongly segregated block copolymers are required for the formation of smaller size microphase-separated structures. In this study, we used a poly(styrene-b-dimetylsiloxane) (PS-b-PDMS) which has large Flory-Huggins interaction parameter. In addition, we investigated this cylinder-forming PS-b-PDMS has large segregation in the bulk condition by small-angle X-ray scattering (SAXS). Consequently, We demonstrated a fabrication of well-ordered arrays of 15nm period PDMS cylinder on the grating substrate with chemical modification. So, we can obtaine less than 10 nm L/S fabrication.

Authors

  • Synsuke Aburaya

    • Kyoto University
    • Department of Polymer Chemistry, Graduate School of Engineering, Kyoto University

  • Satoshi Akasaka

    • Kyoto University

  • Mikihito Takenaka

    • Kyoto University

  • Hirokazu Hasegawa

    • Kyoto University

  • Yasuhiko Tada

    • Hitachi Ltd

  • Hiroshi Yoshida

    • Hitachi Ltd

  • Nikos Hadjichristidis

    • Athens University