Kelvin Probe Microscopy of Single- and Multi-layer Graphene on SiO$_{2}$.

ORAL

Abstract

Kelvin probe microscopy (KPM) was carried out on mechanically exfoliated graphene samples on SiO$_{2}$ in conjunction with standard atomic force microscopy. Potential differences between the SiO$_{2}$ substrate and graphene flakes were large relative to the average fluctuations over the surface of the graphene. KPM shows a consistent surface potential variation between monolayer, bilayer, and multi-layer graphene, and over folded pleats occasionally found in graphene. The source of these surface potential differences will be discussed.

**This work was supported by the University of Maryland MRSEC.

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Authors

  • Alexandra Curtin

    • University of Maryland

  • Theresa Swanson

    • Westminster College

  • Michael Fuhrer

    • University of Maryland
    • Department of Physics and Center for Nanophysics and Advanced Materials, University of Maryland College Park
    • Department of Physics and Center for Nanophysics and Advanced Materials, University of Maryland, College Park, MD 20742, USA
    • Materials Research Science and Engineering Center, Center for Nanophysics and Advanced Materials, Dept of Physics, Univ. of Maryland, College Park, MD
    • Materials Research Science and Engineering Center and Center for Nanophysics and Advanced Materials, Department of Physics, University of Maryland
    • Department of Physics and Center for Nanophysics and Advanced Materials, University of Maryland, College Park, MD 20742-4111, USA