Industrial Advanced Characterizations

Presentations

• Local strain analysis for CMOS technology by Raman and Nano-Raman spectroscopy

  COFFEE_KLATCH · Invited

  March 14, 2008, 10:15 AM – March 14, 2008, 10:51 AM

  Authors

  • Michael Hecker

    • AMD Saxony LLC \& Co. KG

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• Hydrogen storage by physisorption on Metal Organic Frameworks

  COFFEE_KLATCH · Invited

  March 14, 2008, 10:51 AM – March 14, 2008, 11:27 AM

  Authors

  • Anne Dailly

    • General Motors, R\&D center, CES Laboratory

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• Characterization of the pore geometry of porous media and the saturating fluids using 2-dimensional diffusion - NMR relaxation measurements

  COFFEE_KLATCH · Invited

  March 14, 2008, 11:27 AM – March 14, 2008, 12:03 PM

  Authors

  • Martin Dominik Hürlimann

    • Schlumberger - Doll Research

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• Non- linear Optical Spectroscopy of Interfaces

  COFFEE_KLATCH · Invited

  March 14, 2008, 12:03 PM – March 14, 2008, 12:39 PM

  Authors

  • Mohsen Yaganeh

    • ExxonMobil Research and Engineering Co., Corporate Strategic Research
    • Exxon Mobil

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• Development of Silicide Contacts for CMOS devices: Advantages of using Synchrotron Radiation

  COFFEE_KLATCH · Invited

  March 14, 2008, 12:39 PM – March 14, 2008, 1:15 PM

  Authors

  • Christian Lavoie

    • IBM T.J. Watson Research Center

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