Thin-film morphology dependence on adatom-substrate interaction energy

POSTER

Abstract

We study, by kinetic Monte Carlo, the influence of adatom-substrate interaction energy on the morphology of heteroepitaxial film growth. We take the case of (1+1)-dimensions for sake of simplicity. We also define $\alpha$ as the quotient between the above interaction and the adatom-adatom interaction. We measure the roughness in time. We show that changing the value of $\alpha$ it is possible to range from a wetting regime to a non-wetting one. We also show that above a critical thickness, film growth becomes independent of adatom-substrate interaction.

Authors

  • Nuno A.M. Araujo

    • GCEP-Centro de Fisica da Universidade do Minho, 4710 Braga, Portugal; T-12 Group, MS B268, Los Alamos National Laboratory, Los Alamos, NM 87545, USA

  • Cristovao S. Dias

    • GCEP-Centro de Fisica da Universidade do Minho, 4710 Braga, Portugal

  • Antonio Cadilhe

    • T-12 Group, MS B268, Los Alamos National Laboratory, Los Alamos, NM 87545, USA; GCEP-Centro de Fisica da Universidade do Minho, 4710 Braga, Portugal