Detection of Nanomechanical Device Motion by Spatiotemporal Stroboscopic Interferometry

Actuation and detection of nanomechanical device motion in the ultrahigh frequency regime remains a considerable challenge. We have performed broadband characterization of the displacement of silicon NEMS cantilevers and doubly-clamped beams by stroboscopic optical interferometric detection synchronized to pulsed electrostatic actuation. Initial test structures have yielded time-domain measurements of the response of structures having fundamental resonant frequencies up to 580 MHz. Calibration of the vertical displacement sensitivity and imaging of out-of-plane flexural modes will also be discussed. This study aims to extend the potential of interferometry for research on nanomechanical systems.