Nanoscale Pattern Generation and Lithography

Presentations

• Extreme Ultraviolet Lithography

  COFFEE_KLATCH · Invited

  March 16, 2006, 8:00 AM – March 16, 2006, 8:36 AM

  Authors

  • Obert Wood

    • International Sematech

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• Maskless Electron-beam and Optical Lithography

  COFFEE_KLATCH · Invited

  March 16, 2006, 8:36 AM – March 16, 2006, 9:12 AM

  Authors

  • Henry I. Smith

    • Dept. Electrical Engineering and Computer Science, Massachusetts Institute of Technology

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• Ion Beam Patterning at the Nanometer Scale

  COFFEE_KLATCH · Invited

  March 16, 2006, 9:12 AM – March 16, 2006, 9:48 AM

  Authors

  • John Baglin

    • IBM Almaden Research Center

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• Atomic Image Projection Electron Beam Lithography

  COFFEE_KLATCH · Invited

  March 16, 2006, 9:48 AM – March 16, 2006, 10:24 AM

  Authors

  • Ki-Bum Kim

    • Seoul National University

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• Diblock Copolymers for Nanoscale Patterning

  COFFEE_KLATCH · Invited

  March 16, 2006, 10:24 AM – March 16, 2006, 11:00 AM

  Authors

  • Thomas Russell

    • University of Massachusetts at Amherst
    • Polymer Science and Engineering department, University of Massachusetts, Amherst
    • University of Massachusetts - Amherst
    • University of Massachusetts, Amherst
    • Polymer Science and Engineering Department, University of Massachusetts Amherst
    • University of Massachusetts- Amherst
    • Department of Polymer Science and Engineering, University of Massachusetts, Amherst
    • Department of Polymer Science \& Engineering, University of Massachusetts, Amherst, MA 01003
    • University of Massachusetts
    • Dept. of Polymer Science and Engineering, UMASS
    • Polymer Science \& Engr. Dept. UMass

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