Scaling behavior of Film growth mechanism

ORAL

Abstract

Experimental evidence has accumulated that a strained film can grow stably on a vicinal surface. Linear perturbation analysis of the step-flow regime results in a dispersion relation which determines the persistence of the step-flow growth. The dispersion relation can also be used to probe the system parameters. Investigating the growth dynamics in the step-bunching regime, we found that there is a critical film thickness above which step-bunching occurs. The critical thickness shows a scaling behavior depending on the terrace width and the deposition flux. Experiments show a qualitative agreement with the theory. Our results may open a way to grow films in a desired way.

*Supported by DOE.

Authors

  • Mina Yoon

  • H.N. Lee

    • Oak Ridge National Laboratory
  • Zhigang Suo

  • Wei Hong

    • Harvard University
  • Hans M. Christen

  • D.H. Lowndes

    • Oak Ridge National Laboratory
    • Oak Ridge National Laboratory, Oak Ridge, TN, USA
  • Zhenyu Zhang

    • Condensed Matter Sciences Division, Oak Ridge National Lab
    • Oak Ridge National Laboratory
    • Oak Ridge National Laboratory \& University of Tennessee
    • University of Tennessee \& ORNL
    • Oak Ridge National Lab
    • Oak Ridge National Lab, University of Tennessee