Focus Session: Electronic and Atomic Structure of Interfaces and Gate Stacks I

Presentations

• Current Schottky Barrier Concepts

  COFFEE_KLATCH · Invited

  March 24, 2005, 8:15 AM – March 24, 2005, 8:51 AM

  Authors

  • Raymond Tung

    • Department of Physics, Brooklyn College, City University of New York

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• Interface band alignment in high-k gate stacks

  ORAL

  March 24, 2005, 8:51 AM – March 24, 2005, 9:03 AM

  Authors

  • Bersch Eric

    • Rutgers University

  • P. Hartlieb

  • S. Sayan

  • R.A. Bartynski

    • Rutgers University

  • E. Garfunkel

    • Rutgers University

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• Surface States and rectification at a Metal high-k Dielectric Contact

  ORAL

  March 24, 2005, 9:03 AM – March 24, 2005, 9:15 AM

  Authors

  • Alex Demkov

    • Freescale Semiconductor, Inc.

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• Metal screening for CMOS application through vacuum and interface work function ab-initio calculations: benefits and limitations

  COFFEE_KLATCH · Invited

  March 24, 2005, 9:15 AM – March 24, 2005, 9:51 AM

  Authors

  • Leonardo Fonseca

    • Freescale Semicondutores Brasil, Ltda

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• Properties of interfaces between metals and binary oxides.

  ORAL

  March 24, 2005, 9:51 AM – March 24, 2005, 10:03 AM

  Authors

  • Matias Nunez

  • Marco Buongiorno Nardelli

    • NC State University
    • NCSU and ORNL
    • North Carolina State University

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• Bloch States of the Interface Phase

  ORAL

  March 24, 2005, 10:03 AM – March 24, 2005, 10:15 AM

  Authors

  • Curt Billman

    • Oak Ridge National Laboratory

  • Fred Walker

    • University of Tennessee

  • Marco Buongiorno-Nardelli

    • North Carolina State University

  • Rodney McKee

    • Oak Ridge National Laboratory

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• Intrinsic limitations for gate stack applications of complex high-k oxides in advanced Si devices: band edge states

  COFFEE_KLATCH · Invited

  March 24, 2005, 10:15 AM – March 24, 2005, 10:51 AM

  Authors

  • Gerald Lucovsky

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• Optical properties and metrology of the high-k/Si interface

  ORAL

  March 24, 2005, 10:51 AM – March 24, 2005, 11:03 AM

  Authors

  • Stefan Zollner

  • Yong Liang

  • David Theodore

  • Z. Yu

  • Dina Triyoso

  • Jay Curless

  • Clarence Tracy

    • Freescale Semiconductor, Inc.

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• Enhanced permittivity of the interfacial oxide in gate insulator stacks on silicon

  ORAL

  March 24, 2005, 11:03 AM – March 24, 2005, 11:15 AM

  Authors

  • Alfredo Pasquarello

  • Feliciano Giustino

    • EPFL Lausanne (Switzerland)

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