Focus Session: Multifunctional Oxides II
FOCUS · N14 ·
Presentations
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Molecular beam epitaxy for advanced gate stack materials and processes
COFFEE_KLATCH · Invited
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Authors
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Jean-Pierre Locquet
- IBM Research Zurich
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Interface Electrostatics and the Schottky Barrier for Alkaline Earth Oxides on Silicon
ORAL
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Authors
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Rodney McKee
- Oak Ridge National Laboratory
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Fred Walker
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Curt Billman
- Oak Ridge National Laboratory
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Magnetoelectric interactions in single crystal ferrite-piezoelectric bilayers
ORAL
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Authors
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V. M. Petrov
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C. S. Flattery
- Oakland University, Rochester, MI
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G. Srinivasan
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C. P. DeVreugd
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M. I. Bichurin
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A. A. Ivanov
- Novgorod State University, Russia
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J. Zhai
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S. Dong
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D. Viehland
- Virginia Polytechnic and State University, Blacksburg, VA
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Properties of a ferromagnetic semiconductor: epitaxial Co-doped SnO2 films
ORAL
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Authors
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James Burst
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Matthias Batzill
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Ulrike Diebold
- Tulane University
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Probing Enhanced Ferroelectricity in Strained SrTiO3 and BaTiO3 Epitaxial Films using optical Second Harmonic Generation
ORAL
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Authors
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Alok Sharan
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Aravind Vasudeva Rao
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Venkatraman Gopalan
- Materials Research Inst., Penn State Univ.
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Mike Biegalski
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Darrell G. Schlom
- Dept. of Materials Science and Engineering, Penn State Univ.
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Yulan L. Li
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Long-Qing Chen
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Kyoung Jin Choi
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Chang Beom Eom
- Dept. of Materials Science and Engineering, Univ. of Wisconsin-Madison
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Anisotropic epitaxial strain effect on the charge-order phase of Nd$_{0.5}$Sr$_{0.5}$MnO$_{3}$
ORAL
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Authors
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Masao Nakamura
- Dept. of Appl. Phys., Univ. of Tokyo
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Yasushi Ogimoto
- Devices Tech. Res. Labs., Sharp Corp.
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Hiroharu Tamaru
- RCAST, Univ. of Tokyo
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Makoto Izumi
- RCAST, Univ. of Tokyo
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Kenjiro Miyano
- RCAST, Univ. of Tokyo
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Magnetoelectric effect in nanostructured multiferroic ferrite-ferroelectric composite films
ORAL
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Authors
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S.C. Chae
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H.J. Ryu
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D.H. Kim
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T.W. Noh
- ReCOE \& School of Physics, Seoul Natl. Univ., Korea
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C.J. Bae
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J. G. Park
- Department of Physics, SungKyunKwan Univ., Korea
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Y.S. Oh
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K.H. Kim
- CSCMR \& School of Physics, Seoul Natl. Univ., Korea
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SrTiO3 single crystal field-effect transistor with an amorphous CaHfO3 gate insulator
ORAL
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Authors
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Keisuke Shibuya
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Tsuyoshi Ohnishi
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Takayuki Uozumi
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Mikk Lippmaa
- The University of Tokyo
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Hideomi Koinuma
- Tokyo Institute of Technology
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Hydrogen-induced defect generation in amorphous SiO$_{2}$
ORAL
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Authors
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Masayasu Miyata
- Seiko-Epson Corp.
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Adri van Duin
- California Institute of Technology
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Jamil Tahir-Kheli
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William A. Goddard, III
- California Institute of Technology
- Materials and Process Simulation Center, California Institute of Technology
- MSC, Caltech
- Caltech
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High temperature oxidation studies of filtered arc deposited CrAlN nanolayered coatings on steel plates
ORAL
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Authors
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A. Kayani
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C.V. Ramana
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R.J. Smith
- Physics Department, Montana State University-Bozeman, MT 59717
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V.I. Gorokhovsky
- Arcomac Surface Engineering, LLC. Bozeman, MT 59715
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V. Shutthanandan
- Pacific Northwest National Laboratory, Richland, WA 99302
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