Focus Session: Semiconductor Characterization
FOCUS · A18 ·
Presentations
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Interface Sensitive Measurement of High k - silicon dioxide – silicon system using Optical Second Harmonic Generation
COFFEE_KLATCH · Invited
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Authors
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Alain Diebold
- SEMATECH
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Measurement of the Full State of Stress of Silicon with Micro-Raman Spectroscopy
ORAL
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Authors
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Stephen Harris
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Ann O'Neill
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Wen Yang
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Peter Gustafson
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James Boileau
- Ford Research and Advanced Engineering
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Willes H. Weber
- University of Michigan
- APS
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Bhaskar Majumdar
- New Mexico Tech
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Somnath Ghosh
- Ohio State University
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UV-Raman deformation coefficients in Si and SiGe alloys
ORAL
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Authors
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Michael Canonico
- Freescale Semiconductor
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Ran Liu
- Fudan University
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In-situ photovoltage shift measurements of hafnium oxides and silicates grown on Si(100) using femtosecond photoelectron spectroscopy
ORAL
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Authors
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Daeyoung Lim
- IBM T. J. Watson Research Center
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Richard Haight
- IBM T. J. Watson Research Center
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An infrared probe of tunable dielectrics in metal-oxide-semiconductor structures
ORAL
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Authors
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Kevin Mikolaitis
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Zhiqiang Li
- University of California, San Diego
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Guangming Wang
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Alan J. Heeger
- University of California, Santa Barbara
- Institute for Polymers and Organic Solids, University of California, Santa Barbara, CA 93106
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Dimitri Basov
- Department of Physics, University of California San Diego, La Jolla, California 92093-0319
- Department of Physics, University of California at San Diego, La Jolla, CA 92093-0319
- University of California, San Diego
- UCSD
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High Resolution 2D Dopant Profiling of FinFET Structures using Scanning Probe Microscopy
ORAL
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Authors
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Alexander Khajetoorians
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Jianlong Li
- Department of Physics, University of Texas at Austin
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Li Shi
- Department of Mechanical Engineering, University of Texas at Austin
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Xiang-Dong Wang
- Freescale Semiconductor
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Chih-Kang Shih
- Physics Department, The University of Texas at Austin, Austin, Texas, 78712
- University of Texas at Austin
- The University of Texas at Austin
- Department of Physics, University of Texas at Austin
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High-Resolution Microcalorimeters for X-ray Microanalysis
ORAL
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Authors
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B.L. Zink
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G.C. Hilton
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J.N. Ullom
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K.D. Irwin
- Quantum Sensors Project, National Institute of Standards and Technology, Boulder, CO 80305
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High-resolution characterization of advanced interconnect and packaging architectures
ORAL
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Authors
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Shriram Ramanathan
- Components Research, Intel Corp.
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Evan Pickett
- Intel
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Patrick Morrow
- Intel
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Yongmei Liu
- Intel
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Rajen Dias
- Intel
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Direct Imaging of Minority Carrier Drift in Luminescent Materials
ORAL
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Authors
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David Luber
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Nancy Haegel
- Naval Postgraduate School
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Contact-free approach for the determination of minority carrier diffusion length
ORAL
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Authors
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F.M. Bradley
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Will Freeman
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Nancy Haegel
- Naval Postgraduate School
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Structural and morphological characterization of GaN(0001) layers grown on SiC by maskless pendeo-epitaxy via X-ray Microdiffraction
ORAL
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Authors
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R.I. Barabash
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G.E. Ice
- Oak Ridge National Laboratory
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S. Einfeldt
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D. Hommel
- University of Bremen
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A.M. Roskovski
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R.F. Davis
- North Carolina State University
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UHV Nanoworkbench and the `Roaming' Field Effect Transistor
ORAL
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Authors
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Olivier Guise
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John T. Yates, Jr.
- Surface Science Center, Center for Oxide Semiconductor Materials for Quantum Computation, Dept of Chem., Univ. of Pittsburgh
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Joachim Ahner
- Seagate Technology
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Jeremy Levy
- Dept. of Physics and Astronomy, University of Pittsburgh
- Department of Physics and Astronomy, University of Pittsburgh, Pittsburgh, PA 15260
- University of Pittsburgh
- Surface Science Center, Center for Oxide Semiconductor Materials for Quantum Computation, Dept of Physics and Astronomy, Univ. of Pittsburgh
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An investigation of dopping profile for a one dimensional heterostructure
ORAL
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Authors
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ZhaoHui Huang
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Dragan Stojkovic
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Paul Lammert
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Vincent Crespi
- Department of Physics, The Pennsylvania State University
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