Optically measured plasma density using Phase Resolved Optical Emission Spectroscopy in low-pressure capacitive discharges

ORAL

Abstract

As plasma applications continue to advance technologically and grow in complexity, precise plasma diagnostics are crucial for optimizing plasma processes. However, diagnosing plasma properties remains both technically and physically challenging, requiring non-intrusive methods that maintain uninterrupted plasma operation while also incorporating a fundamental understanding of plasma physics. In this study, we measure electron density using a non-invasive optical measurement in low-pressure capacitive discharges. This optical approach provides nanosecond time-resolved insights into the dynamics of energetic electrons, particularly the multiple electron beams that are launched into the plasma during a single phase of sheath expansion adjacent to an electrode. As the time interval between two consecutive beams corresponds to the inverse instantaneous electron plasma frequency, the absolute electron density can be determined by measuring this time interval. The measured electron density is found to oscillate within the radio-frequency period under low-pressure discharge conditions. The dynamics of this density oscillation is analyzed using the continuity equation, accounting for the contribution of the electron beams.

*This research was supported by i) the National Research Council of Science & Technology (NST) grant by the Korea government (MSIT) (CRC20014-000); ii) Korea Evaluation Institute of Industrial Technology (Grant No. 2410000101); iii) Korea Research Institute of Standards and Science (Grant No. KRISS GP2025-0013-02); iv) the MOTIE (Ministry of Trade, Industry & Energy) (Grant Nos. 2410000258, 2410000200, 2410003567) and KSRC (Korea Semiconductor research Consortium) (Grant Nos. 00235950, 00237058); v) Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education (Grant No. RS-2024-00407243). J. Schulze acknowledges support of this research by the German Research Foundation via projects 428942393 and 138690629.

Presenters

  • CHANWON PARK

    • Korea Research Institute of Standards and Science

Authors

  • CHANWON PARK

    • Korea Research Institute of Standards and Science
  • Julian Schulze

    • Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany
  • Birk Berger

    • House of Plasma GmbH
  • Gwang-seok Chae

    • Korea Research Institute of Standards and Science
  • Jung-Hyung Kim

    • Korea Research Institute of Standards and Science
  • Hyo-Chang Lee

    • Korea Aerospace University