Hybrid Particle In Cell Monte Carlo simulations of extreme ultraviolet-induced beam line discharge

ORAL

Abstract

The properties of hydrogen plasma in Extreme Ultra Violet (EUV) lithography machines impact various physical phenomena, including material degradation and particle behavior. To assess material durability and robustness under plasma conditions, multiple tests are conducted in EUV-beam-line 2 (EBL2). A thorough characterization of the EBL2 plasma setup is crucial for understanding the plasma influence on sensitive components. The setup is modeled using a 3D Hybrid-Particle-In-Cell-Kinetic-Monte-Carlo method, and the simulation results are compared with available measurements, revealing transient plasma behavior.

*This work is funded by ASML.

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Presenters

  • Efe Kemaneci

    • ASML

Authors

  • Efe Kemaneci

    • ASML

  • Dmitry Astakhov

    • ISTEQ

  • Jacqueline van Veldhoven

    • TNO

  • Aneta Stodolna

    • TNO

  • Arnold Storm

    • TNO

  • Luuk Heijmans

    • ASML

  • Andrei M Yakunin

    • ASML

  • Mark van de Kerkhof

    • ASML