Capacitively Coupled Plasmas III

ORAL · IR3 · ID: 3430013

Presentations

  • ORAL

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    Publication: A portion of the content presented in this abstract has been submitted as a manuscript to Plasma Sources Science and Technology (Manuscript Reference: PSST-107055).

    Presenters

    • Jianxiong Yao

      • Beijing Institute of Technology

    Authors

    • Jianxiong Yao

      • Beijing Institute of Technology

    • Bocong Zheng

      • Beijing Institute of Technology

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  • ORAL

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    Presenters

    • Yi-Fan Zhang

      • Dalian University of Technology

    Authors

    • Yi-Fan Zhang

      • Dalian University of Technology

    • Wan Dong

      • Dalian University of Technology
      • Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Ministry of Education), School of Physics, Dalian University of Technology, Dalian

    • Liuqin Song

      • Dalian University of Technology

    • Wenzhu Jia

      • Southwest University

    • Julian Schulze

      • Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

    • Yuanhong Song

      • Dalian University of Technology
      • School of Physics, Dalian University of Technology, Dalian, China
      • Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Ministry of Education), School of Physics, Dalian University of Technology, Dalian

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  • ORAL

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    Publication: planned papers

    Presenters

    • Zhenhua Zhou

      • Tsinghua University

    Authors

    • Zhenhua Zhou

      • Tsinghua University

    • Xiaokun Wang

      • Ruhr University Bochum

    • Dong Yang

      • Tsinghua University

    • Hanyang Li

      • Tsinghua University

    • Wenjin Zhang

      • Tsinghua University

    • Julian Schulze

      • Ruhr University Bochum

    • Peter Hartmann

      • Wigner Research Center for Physics

    • Zoltan Donko

      • Wigner Research Center for Physics
      • HUN-REN Wigner Research Centre for Physics, Budapest, Hungary
      • Institute for Solid State Physics and Optics, HUN-REN Wigner Research Centre for Physics

    • Yong-Xin Liu

      • Dalian University of Technology

    • Yangyang Fu

      • Tsinghua University

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  • ORAL

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    Publication: [1] Z. Donkó et al., "Metastable argon atom kinetics in a low-pressure capacitively coupled radio frequency discharge," Plasma Sources Sci. Technol., vol. 32, no. 6, p. 065002, Jun. 2023, doi: 10.1088/1361-6595/acd6b5.
    [2] D.-Q. Wen, J. Krek, J. T. Gudmundsson, E. Kawamura, M. A. Lieberman, and J. P. Verboncoeur, "Particle-in-Cell Simulations With Fluid Metastable Atoms in Capacitive Argon Discharges: Electron Elastic Scattering and Plasma Density Profile Transition," IEEE Trans. Plasma Sci., vol. 50, no. 9, pp. 2548–2557, Sep. 2022, doi: 10.1109/TPS.2022.3174401.

    Presenters

    • Shu Zhang

      • Lpp, Ecole Polytechnique
      • Advanced Space Propulsion and Energy Laboratory (ASPEL), School of Astronautics, Beihang University, Beijing, 102206, China; Centrale Pekin, Beihang University, Beijing,100191

    Authors

    • Shu Zhang

      • Lpp, Ecole Polytechnique
      • Advanced Space Propulsion and Energy Laboratory (ASPEL), School of Astronautics, Beihang University, Beijing, 102206, China; Centrale Pekin, Beihang University, Beijing,100191

    • Alejandro Alvarez Laguna

      • CNRS - Laboratoire de Physique des Plasmas

    • Jean-Paul Booth

      • LPP, Ecole Polytechnique, Sorbonne Université, Institut Polytechnique de Paris, CNRS, France

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