Plasma Etching II

Presentations

• Controlling Energetic Neutral Beams Produced from Inductively Coupled Plasmas for Material Processing Applications

  ORAL

  Oct. 16, 2025, 9:00 AM – Oct. 16, 2025, 9:15 AM

  Presenters

  • Gonçalo A Cardoso

    • University of Michigan

  Authors

  • Gonçalo A Cardoso

    • University of Michigan

  • Mark J Kushner

    • University of Michigan

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• Practical Application of Directional Ion Beam Etching for Cost-Effective Sub-Lithographic Metal Line Fabrication

  ORAL

  Oct. 16, 2025, 9:15 AM – Oct. 16, 2025, 9:30 AM

  Presenters

  • Hobum Choi

    • Samsung Electronics

  Authors

  • Hobum Choi

    • Samsung Electronics

  • Jongsoon Park

    • Samsung Electronics

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• Transportation Effects and Uniformity Control in Magnetized Capacitively Coupled Plasma

  ORAL · Invited

  Oct. 16, 2025, 9:30 AM – Oct. 16, 2025, 10:00 AM

  Publication: 1.Fang-Fang Ma, Quan-Zhi Zhang*, Julian Schulze, Yu-Meng Cui, You-Nian Wang, Extensive adjustment of magnetic field on plasma density and ion incidence angle in radio frequency discharge, Plasma Sources Sci. Technol.,2025, 34 025006
  2.Fang-Fang Ma, Quan-Zhi Zhang*,Yu-Meng Cui, and You-Nian Wang, Enhancing plasma uniformity by employing non-uniform magnetic field modulation in capacitively coupled plasmas, Appl. Phys. Lett. 2023, 123, 202103

  Presenters

  • Quan Zhi Zhang

    • Dalian University of Technology

  Authors

  • Quan Zhi Zhang

    • Dalian University of Technology

  • Julian Schulze

    • Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

  • You-Nian Wang

    • Dalian university of technology
    • Dalian University of Technology

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• Applying tailored waveform biasing to industrially-relevant etch processes for semiconductor fabrication

  ORAL

  Oct. 16, 2025, 10:00 AM – Oct. 16, 2025, 10:15 AM

  Presenters

  • Benjamin Harris

    • Oxford Instruments Plasma Technology

  Authors

  • Benjamin Harris

    • Oxford Instruments Plasma Technology

  • Daryl White

    • Oxford Instruments Plasma Technology

  • Geoff Hassall

    • Oxford Instruments Plasma Technology
    • Oxford Instruments Plasma Technology, Severn Beach, Bristol BS35 4GG, UK

  • James Ellis

    • Oxford Instruments Plasma Technology

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• The effect of bias frequency on etch profiles in ultra-low electron temperature plasma

  ORAL

  Oct. 16, 2025, 10:15 AM – Oct. 16, 2025, 10:30 AM

  Presenters

  • Nayeon Kim

    • Hanyang University

  Authors

  • Nayeon Kim

    • Hanyang University

  • Junyoung Park

    • Hanyang university

  • Chin-Wook Chung

    • Department of electrical engineering, Hanyang University, Seoul, Korea1
    • Hanyang University

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