Plasma-Surface Interactions II
FOCUS · GR2 · ID: 3429856
Presentations
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Multi-scale Simulations of Ion Energy Effects on Amorphous Silicon (a-Si:H) Film Deposition
ORAL
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Presenters
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Liuqin Song
- Dalian University of Technology
Authors
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Liuqin Song
- Dalian University of Technology
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Wenzhu Jia
- Southwest University
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Wan Dong
- Dalian University of Technology
- Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Ministry of Education), School of Physics, Dalian University of Technology, Dalian
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Yi-Fan Zhang
- Dalian University of Technology
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Yuanhong Song
- Dalian University of Technology
- School of Physics, Dalian University of Technology, Dalian, China
- Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Ministry of Education), School of Physics, Dalian University of Technology, Dalian
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Plasma-electrochemical cell interaction: a novel approach to study plasma-surface chemical interactions
ORAL
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Presenters
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Richard van de Sanden
- DIFFER, Eindhoven, The Netherlands
- Dutch Institute for Fundamental Energy Research (DIFFER), Eindhoven, The Netherlands
Authors
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Richard van de Sanden
- DIFFER, Eindhoven, The Netherlands
- Dutch Institute for Fundamental Energy Research (DIFFER), Eindhoven, The Netherlands
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Xingyu Chen
- Dutch Institute of Fundemental Energy Research, Eindhoven, The Netherlands and School of Electrical Engineering, Xi'an Jiaotong University, Xi'an, China
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Aleksandr Pikalev
- Dutch Institute for Fundamental Energy Research (DIFFER), Eindhoven, The Netherlands
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Vasco Guerra
- Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Lisbon University
- Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa
- Instituto Superior Tecnico
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Michail Tsampas
- Dutch Institute for Fundamental Energy Research (DIFFER), Eindhoven, The Netherlands
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Exploring the Impact of Mask Geometries on High Aspect Ratio Silicon Etching Using Cl<sub>2</sub>/O<sub>2</sub> Plasmas
ORAL · Invited
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Presenters
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Xingyi Shi
- Applied Materials
Authors
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Xingyi Shi
- Applied Materials
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Han Luo
- Applied Materials, Inc.
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Shahid Rauf
- Applied Materials, Inc.
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Jason Kenney
- Applied Materials
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Estimating the O recombination probability in Pyrex from the loss frequency in oxygen-containing plasma
ORAL
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Publication: Submitted to PSST: Assessing the meaning of the atomic oxygen loss frequency and recombination probability in oxygen glow discharges in Pyrex
Planned: Estimating the O recombination probability in Pyrex from the loss frequency in CO2 plasmaPresenters
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Pedro Viegas
- Instituto Superior Técnico - Universidade de Lisboa
- Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico - Universidade de Lisboa
Authors
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Pedro Viegas
- Instituto Superior Técnico - Universidade de Lisboa
- Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico - Universidade de Lisboa
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Tiago C Dias
- University of Michigan
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Vasco Guerra
- Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Lisbon University
- Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa
- Instituto Superior Tecnico
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Plasma Polymerization into 3D Structures
ORAL
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Presenters
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Lenka Zajickova
- CEITEC, Brno University of Technology
Authors
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Lenka Zajickova
- CEITEC, Brno University of Technology
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David Necas
- CEITEC, Brno University of Technology
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Martina Janusova
- CEITEC, Brno University of Technology
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Lucie Janu
- CEITEC, Brno University of Technology
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Paula Navascués
- Empa, Swiss Federal Laboratories for Materials Science and Tecnology
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Dirk Hegemann
- Empa, Swiss Federal Laboratory for Materials Science and Technology
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Nicole Rusnakova
- Faculty of Science, Masaryk University, Brno
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