Plasma Semiconductor Applications
FOCUS · DT1 · ID: 3430208
Presentations
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The effect of cryogenic substrate cooling on electron energy distribution in inductively coupled plasma
ORAL
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Presenters
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JONGHA AHN
- Department of Electrical Engineering, Hanyang University
Authors
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JONGHA AHN
- Department of Electrical Engineering, Hanyang University
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DEOKHWAN KIM
- Hanyang university
- Department of electrical engineering, Hanyang University, Seoul, Korea
- Department of Electrical Engineering, Hanyang University
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Chin-Wook Chung
- Department of electrical engineering, Hanyang University, Seoul, Korea1
- Hanyang University
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Development of a Transformer-Coupled Plasma Source with Enhanced Radical Delivery and Plasma Ignition for Next-Generation Plasma Processing
ORAL
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Presenters
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Jaehoon Choi
- Wonik IPS
Authors
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Jaehoon Choi
- Wonik IPS
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Tae S Cho
- Wonik IPS
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Development of a High-Pressure Compatible Self Plasma-Optical Emission Spectrometer for Real-Time Plasma Process Monitoring
ORAL
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Presenters
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Geon Woong Eom
- Korea Institute of Machinery and Materials
Authors
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Geon Woong Eom
- Korea Institute of Machinery and Materials
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SangHo Lee
- Semiconfuctor Equipment Research Center, Korea Institute of Machinery and Materials
- Korea Institute of Machinery and Materials
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InYong Park
- Semiconfuctor Equipment Research Center, Korea Institute of Machinery and Materials
- Korea Institute of Machinery and Materials
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Woo Seok Kang
- Semiconfuctor Equipment Research Center, Korea Institute of Machinery and Materials
- Korea Institute of Machinery and Materials
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Min Hur
- Semiconfuctor Equipment Research Center, Korea Institute of Machinery and Materials
- Korea Institute of Machinery and Materials
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Dae-Woong Kim
- Semiconfuctor Equipment Research Center, Korea Institute of Machinery and Materials
- Korea Institute of Machinery and Materials
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Tunable antenna array for large area microwave plasma source for semiconductor manufacturing
ORAL
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Presenters
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Giwon Shin
- Wonik IPS
Authors
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Giwon Shin
- Wonik IPS
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Jaehoon Choi
- Wonik IPS
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Sooyoung Hwang
- Wonik IPS
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Jeonghun Kim
- Wonik IPS
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Hakmin Kim
- Wonik IPS
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Minhee Lee
- Wonik IPS
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Tae S Cho
- Wonik IPS
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Hyunho Yun
- Wonik IPS
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Beamline pressure effect on ion beam transport in ion implanters
ORAL · Invited
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Presenters
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John (Bon-Woong) Koo
- Applied Materials
Authors
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John (Bon-Woong) Koo
- Applied Materials
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Frank Sinclair
- Applied Materials
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Paul Murphy
- Applied Materials
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