Effects of DC magnetic field on an inductively coupled plasma with a DC biased grid
POSTER
Abstract
*This work was supported by the Technology Innovation Program (or Industrial Strategic Technology Development Program-Public-private joint investment semiconductor R&D program(K-CHIPS) to foster high-quality human resources) (RS-2023-00236642, Development of etching process and diagnostic technology using precursor with low GWP for next generation semiconductor process) funded By the Ministry of Trade, Industry & Energy(MOTIE, Korea)(1415187459)This work was supported by the Technology Innovation Program (20018982, High productivity hard mask PR stripper with high density plasma source) funded By the Ministry of Trade, Industry & Energy(MOTIE, Korea)This work was supported by the MOTIE(Ministry of Trade, Industry & Energy) (1415187722) and KSRC(Korea Semiconductor Research Consortium) (RS-2023-00235950) support program for the development of the future semiconductor device.
Presenters
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Jeonghyun Lee
- Hanyang University