Organic Micropollutant Wastewater Treatment using a DBD Plasma and Flat 222 nm Far UV-C Excilamp
ORAL
Abstract
Conventional low-pressure UV (LP-UV) lamps emit light with a wavelength of 254 nm, which is efficient in deactivation of microorganisms but can also be harmful to the skin and eyes upon exposure. In contrast, KrCl* excimer lamps emit ultraviolet (UV) light in the far-UVC range, specifically between 200 and 222 nanometers (nm). These lamps have been demonstrated to successfully eliminate harmful microorganisms without posing a risk of harming human cells. Several studies have been published that provide evidence that far-UVC is a safer option for human exposure and more efficient in terms of disinfection than LP-UV [1] [2]. Nevertheless, few studies have examined the utilization of KrCl* excimer lamps for UV/advanced oxidation processes (AOPs) [3].
In this study, two organic micropollutants have been degraded by means of an environmentally friendly mercury-free far UV-C excimer light source along with an advanced oxidation process (AOP) using H2O2. For this purpose, a dielectric barrier discharge (DBD) plasma-based 222 nm wavelength excilamp has been designed and developed. The production of OH radicals in three different Advanced Oxidation Process (AOP) systems—LP-UV/H2O2, KrCl*/H2O2, and KrCl*/nitrate—was then compared. The results indicate that the UV/nitrate combination exhibited the highest level of steady-state OH concentration, followed by KrCl*/H2O2, and then LP-UV/H2O2. Additionally, we examined the differences in contaminant degradation for carbamazepine and sulfamethoxazole between KrCl* excimer lamps and low-pressure ultraviolet (LPUV) lamps. The findings show that, in comparison to LP-UV treatment, direct photolysis employing KrCl* excimer lamps significantly improves the degradation rate constants of carbamazepine and sulfamethoxazole. This improvement is likely due to a molar absorption coefficient that is more prominent at 222 nm rather than 254 nm. Compared to KrCl* excimer direct photolysis, KrCl*/AOP demonstrated improved degradation of carbamazepine; however, it did not increase the degradation of sulfamethoxazole. The analysis of this study will be presented.
In this study, two organic micropollutants have been degraded by means of an environmentally friendly mercury-free far UV-C excimer light source along with an advanced oxidation process (AOP) using H2O2. For this purpose, a dielectric barrier discharge (DBD) plasma-based 222 nm wavelength excilamp has been designed and developed. The production of OH radicals in three different Advanced Oxidation Process (AOP) systems—LP-UV/H2O2, KrCl*/H2O2, and KrCl*/nitrate—was then compared. The results indicate that the UV/nitrate combination exhibited the highest level of steady-state OH concentration, followed by KrCl*/H2O2, and then LP-UV/H2O2. Additionally, we examined the differences in contaminant degradation for carbamazepine and sulfamethoxazole between KrCl* excimer lamps and low-pressure ultraviolet (LPUV) lamps. The findings show that, in comparison to LP-UV treatment, direct photolysis employing KrCl* excimer lamps significantly improves the degradation rate constants of carbamazepine and sulfamethoxazole. This improvement is likely due to a molar absorption coefficient that is more prominent at 222 nm rather than 254 nm. Compared to KrCl* excimer direct photolysis, KrCl*/AOP demonstrated improved degradation of carbamazepine; however, it did not increase the degradation of sulfamethoxazole. The analysis of this study will be presented.
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Publication: [1] K. Ahlawat, R. Jangra, A. Ish, N. Jain, and R. Prakash, A Dielectric Barrier Discharge Based Low Pressure Narrow Band Far UV-C 222 Nm Excimer Lamp and Its Efficiency Analysis, Phys. Scr. 99, 025018 (2024).
[2] K. Ahlawat, R. Jangra, and R. Prakash, Environmentally Friendly UV ‑ C Excimer Light Source with Advanced Oxidation Process for Rapid Mineralization of Azo Dye in Wastewater, ACS Omega 9, 15615 (2024).
[3] K. Ahlawat, R. Jangra, and R. Prakash, Accelerated Mineralization of Textile Wastewater under 222 Nm Irradiation from Kr/Cl2 Excilamp : An Environmentally Friendly and Energy Efficient Approach, Sci. Rep. 1 (2024).
Presenters
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Kiran Ahlawat
- Indian Institute of Technology, Jodhpur