Chemical Synthesis by Plasma

FOCUS · FW5 · ID: 2480502

Presentations

  • ORAL

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    Presenters

    • Maxime Jacquart

      • Institut Jean le Rond d'Alembert, Sorbonne Université
      • Onera

    Authors

    • Maxime Jacquart

      • Institut Jean le Rond d'Alembert, Sorbonne Université
      • Onera

    • Carolina A Garcia Soto

      • ONERA

    • Federico Boni

      • ONERA
      • Physics Instrumentation and Space Department, ONERA, Université Paris-Saclay, 91123 Palaiseau, France

    • Paul-Quentin Elias

      • ONERA

    • Maria Elena Galvez Parruca

      • INMA, CSIC-Universidad de Zaragoza

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  • ORAL

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    Publication: A. Böddecker et al., "The role of flow field dynamics in enhancing volatile organic compound conversion in a surface dielectric barrier discharge system." arXiv, 2024. doi: 10.48550/ARXIV.2405.01875.

    A. Böddecker et al., "The role of flow field dynamics in enhancing volatile organic compound conversion in a surface dielectric barrier discharge system." Submitted manuscript to Journal of Physics D: Applied Physics

    Presenters

    • Alexander Böddecker

      • Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany
      • Ruhr University, Bochum, Germany

    Authors

    • Alexander Böddecker

      • Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany
      • Ruhr University, Bochum, Germany

    • Maximilian Passmann

      • Chair of Hydraulic Fluid Machinery, Ruhr University Bochum, Bochum, Germany

    • Angie Natalia Torres Segura

      • Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

    • Arisa Bodnar

      • Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

    • Felix Awakowicz

      • Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

    • Martin Muhler

      • Laboratory of Industrial Chemistry (LTC), Ruhr University Bochum, Bochum, Germany

    • Peter Awakowicz

      • Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Germany
      • Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

    • Andrew R Gibson

      • University of York
      • York Plasma Institute, School of Physics, Engineering and Technology, University of York, United Kingdom
      • York Plasma Institute, University of York, Heslington, United Kingdom
      • Ruhr University Bochum

    • Ihor Korolov

      • Ruhr University, Bochum, Germany
      • Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany
      • Ruhr University Bochum

    • Thomas Mussenbrock

      • Ruhr University, Bochum, Germany
      • Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

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  • ORAL · Invited

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    Publication: J. Wang et al., J. Am. Chem. Soc. 2023, 14, 19, 10470-10474.

    Presenters

    • R. Mohan Sankaran

      • Department of Nuclear, Plasma, and Radiological Engineering, University of Illinois Urbana-Champaign, Urbana, IL
      • Nuclear, Plasma and Radiological Engineering, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States
      • University of Illinois Urbana-Champaign

    Authors

    • R. Mohan Sankaran

      • Department of Nuclear, Plasma, and Radiological Engineering, University of Illinois Urbana-Champaign, Urbana, IL
      • Nuclear, Plasma and Radiological Engineering, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States
      • University of Illinois Urbana-Champaign

    View abstract →