Plasma Etching I
FOCUS · ET2 · ID: 2480671
Presentations
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Physical and chemical effects in low temperature etching of memory devices
ORAL · Invited
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Presenters
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Thorsten Lill
- Lam Research
Authors
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Thorsten Lill
- Lam Research
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Youn-Jin Oh
- Lam Research
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Mark Wilcoxson
- Lam Research
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Harmeet Singh
- Lam Research
- Lam Research Corporation
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Digital Twins for Plasma-Surface Interactions in Atomic Layer Etching
ORAL
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Presenters
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David Barry Graves
- Chemical & Biological Engineering Princeton University
- Princeton University
Authors
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David Barry Graves
- Chemical & Biological Engineering Princeton University
- Princeton University
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Joseph R Vella
- TEL Technology Center, America
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Effect of Secondary Electron Emission on Surface Charging during Plasma Etching for Microelectronics Fabrication
ORAL
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Presenters
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Chenyao Huang
- University of Michigan
Authors
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Chenyao Huang
- University of Michigan
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Steven C Shannon
- North Carolina State University
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Mark Jay Kushner
- University of Michigan
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Process Control of Plasma Etching of SiN, SiO<sub>2</sub> and poly-Si films via Enhanced Fragmentation of CHF<sub>2</sub>CF<sub>3</sub> and CF<sub>3</sub>CH<sub>3</sub>, CHF<sub>2</sub>CH<sub>3</sub>
ORAL
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Presenters
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Trung Nguyen Tran
- Nagoya University
Authors
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Trung Nguyen Tran
- Nagoya University
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Toshio Hayashi
- Nagoya University
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Hiroshi Iwayama
- UVSOR Sychrotron Facility
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Shih-Nan Hsiao
- Nagoya university
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Makoto Sekine
- Nagoya University
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Masaru Hori
- Center for Low-temperature Plasma Sciences, Nagoya University, Japan
- Nagoya University
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Kenji Ishikawa
- Center for Low-temperature Plasma Sciences, Nagoya University, Japan
- Nagoya University, Japan
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Characterization and Effects of Fluorine-Containing Ionic Liquid Ion Beams on Metal-Coated Substrates
ORAL
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Presenters
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Nazli Turan
- University of Southampton
Authors
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Nazli Turan
- University of Southampton
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Charlie Ryan
- University of Southampton
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Extraction and Transport of Positive and Negative Ions in Plasma Etch Applications
ORAL
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Presenters
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Sergey Voronin
- TEL Technology Center
- TEL TECHNOLOGY CENTER, AMERICA, LLC
Authors
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Sergey Voronin
- TEL Technology Center
- TEL TECHNOLOGY CENTER, AMERICA, LLC
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Nicholas Smieszek
- TEL TECHNOLOGY CENTER, AMERICA, LLC
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Carl Lynwood Smith
- TEL TECHNOLOGY CENTER, AMERICA, LLC
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Qi Wang
- TEL TECHNOLOGY CENTER, AMERICA, LLC
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Akiteru Ko
- TEL TECHNOLOGY CENTER, AMERICA, LLC
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