Plasma Etching II

FOCUS · ER2 · ID: 2480686

Presentations

  • ORAL

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    Publication: Appl. Phys. Lett. 123, 232108 (2023)

    Presenters

    • Sunghyun Son

      • Princeton University

    Authors

    • Sunghyun Son

      • Princeton University

    • Geunwoo Go

      • Seoul National University

    • Willca Villafana

      • Princeton Plasma Physics Laboratory

    • Igor D Kaganovich

      • Princeton Plasma Physics Laboratory

    • Alexander V. Khrabrov

      • Princeton Plasma Physics Laboratory

    • Hyo-Chang Lee

      • Korea Aerospace University

    • Gwang-Seok Chae

      • Korea Aerospace University

    • SeungBo Shim

      • Samsung Electronics Co. Ltd

    • Donghyeon Na

      • Samsung Electronics Co. Ltd

    • June Young Kim

      • Korea University

    View abstract →

  • ORAL

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    Publication: [1] A V Phelps and Z Lj Petrovic 1999 Plasma Sources Sci. Technol. 8 R21

    Presenters

    • Sanjana Kerketta

      • Lam Research

    Authors

    • Sanjana Kerketta

      • Lam Research

    • Chenhui Qu

      • Lam Research
      • Lam research

    • Saurav Gautam

      • Lam research

    • Rohini Mishra

      • Lam research

    • Anamika Chowdhury

      • Lam research

    • Saravanapriyan Sriraman

      • Lam Research
      • Lam Research Corporation

    View abstract →

  • ORAL

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    Publication: [1] C. C. Hsu, J. W. Coburn, D. B. Graves, "Etching of ruthenium coating in O2- and Cl2- containing plasmas", Journal of Vacuum Science and Technology, A, Vol. 24 (2006), pp. 1-8
    [2] K. Karahashi, and S. Hamaguchi, J. Phys. D: Appl. Phys. 47, 224008(2014)

    Presenters

    • Takuma Yanagisawa

      • Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University

    Authors

    • Takuma Yanagisawa

      • Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University

    • Tomoko Ito

      • Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University

    • Masaya Imai

      • R&D Group, Hitachi, Ltd.,

    • Katsuya Miura

      • R&D Group, Hitachi, Ltd.,

    • Miyako Matsui

      • R&D Group, Hitachi, Ltd.,

    • Kazuhiro Karahashi

      • Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University

    • Satoshi Hamaguchi

      • Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University
      • Osaka University

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  • ORAL

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    Presenters

    • Xue Wang

      • Colorado School of Mines

    Authors

    • Xue Wang

      • Colorado School of Mines

    • Prabhat Kumar

      • Lam Research Corporation

    • Thorsten Lill

      • Lam Research Corporation

    • Harmeet Singh

      • Lam Research
      • Lam Research Corporation

    • Mingmei Wang

      • Lam Research Corporation

    • Taner Ozel

      • Lam Research Corporation

    • Sumit Agarwal

      • Colorado School of Mines

    View abstract →