Plasma Diagnostics and Etching
FOCUS · GW1 · ID: 1531135
Presentations
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Probing low temperature plasmas with structured light beams and derivative spectroscopy
ORAL · Invited
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Presenters
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Ivan Romadanov
- Princeton Plasma Physics Laboratory
Authors
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Ivan Romadanov
- Princeton Plasma Physics Laboratory
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Plasma-based pseudo-wet mechanism for cryogenic SiO<sub>2</sub> etching using hydrogen-contained fluorocarbon gases with an in-situ surface analysis
ORAL
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Presenters
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Shih-Nan Hsiao
- Nagoya university
Authors
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Shih-Nan Hsiao
- Nagoya university
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Makoto Sekine
- Nagoya University
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Takayoshi Tsutsumi
- Nagoya University
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Kenji Ishikawa
- Nagoya University, Japan
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Manabu Iwata
- Tokyo Electron Ltd.
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Maju Tomura
- Tokyo Electron Miyagi Ltd.
- Tokyo Electron Ltd.
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Yuki Iijima
- Tokyo Electron Ltd.
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Taku Gohira
- Tokyo Electron Ltd.
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Keiichi Matsushima
- Tokyo Electron Ltd.
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Yoshinobu Ohya
- Tokyo Electron Ltd.
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Masaru Hori
- Nagoya University
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Automatic Optimization of Reaction Mechanisms in Simulations of High Aspect Ratio Plasma Etching
ORAL
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Presenters
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Florian Krueger
- University of Michigan
Authors
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Florian Krueger
- University of Michigan
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Du Zhang
- TEL Technology Center, America, LLC
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Pingshan Luan
- TEL Technology Center, America, LLC
- TEL TECHNOLOGY CENTER, AMERICA, LLC
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Minsoek Oh
- TEL Technology Center, America, LLC
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Minjoon Park
- TEL Technology Center, America, LLC
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Andrew Metz
- TEL Technology Center, America, LLC
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Mark J Kushner
- University of Michigan
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State-of-the-art plasma etch process and technologies for high aspect ratio pattern
ORAL · Invited
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Publication: [1] Y. Kihara, et al., VLSI symposium Technology and Circuit, T3-2, 2023.
Presenters
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Maju Tomura
- Tokyo Electron Miyagi Ltd.
- Tokyo Electron Ltd.
Authors
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Maju Tomura
- Tokyo Electron Miyagi Ltd.
- Tokyo Electron Ltd.
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MASANOBU HONDA
- Tokyo Electron Miyagi Ltd.
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YOSHIHIDE KIHARA
- Tokyo Electron Miyagi Ltd.
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