Plasma Deposition & Damage

Presentations

• In-situ Diagnostics for Plasma Enhanced ALD and CVD

  ORAL · Invited

  Oct. 10, 2023, 1:30 PM – Oct. 10, 2023, 2:00 PM

  Presenters

  • Jianping Zhao

    • Tokyo Electron America

  Authors

  • Jianping Zhao

    • Tokyo Electron America

  • John Carroll

    • Tokyo Electron America

  • Peter L Ventzek

    • Tokyo Electron America

  • Charles Schlechte

    • Tokyo Electron America

  • Tsung-Hsuan Yang

    • University of Texas at Austin

  • Ting-Ya Wang

    • University of Texas at Austin

  • Samuel Johnson

    • University of Texas at Austin

  • John G Ekerdt

    • University of Texas at Austin

  • Gyeong S Hwang

    • University of Texas at Austin

  View abstract →

• Development of Yttrium Oxide Film Deposition Method using Low-temperature Microwave Excited Atmospheric Pressure Plasma Jet

  ORAL

  Oct. 10, 2023, 2:00 PM – Oct. 10, 2023, 2:15 PM

  Publication: [1] Y. Kobayashi et al., "Current Status and Needs in the Future of Ceramics Used for Semiconductor Production Equipment", Proc. 37th Seminar on High-Temperature Ceramics, K. Matsuhiro, Ed., July 19, 2005 (Osaka, Japan), Japan Ceramics Society, 2005, p 1-7 (in Japanese)
  [2] M. Kindelmann et al., "Erosion behavior of Y2O3 in fluorine-based etching plasmas: Orientation dependency and reaction layer formation," Journal of the American Ceramic Society, vol. 104, no. 3, pp. 1465–1474, Mar. 2021, doi: 10.1111/jace.17556.

  Presenters

  • Bat-Orgil Erdenezaya

    • Kanazawa University

  Authors

  • Bat-Orgil Erdenezaya

    • Kanazawa University

  • Hirochika Uratani

    • Division of Electrical Engineering and Computer Science, Kanazawa University, Ishikawa, Japan

  • Ruka Yazawa

    • Nanomaterials Research Institute, Kanazawa University, Ishikawa, Japan

  • Md. Shahiduzzaman

    • Nanomaterials Research Institute, Kanazawa University, Ishikawa, Japan

  • Tetsuya Taima

    • Nanomaterials Research Institute, Kanazawa University, Ishikawa, Japan

  • Yusuke Nakano

    • Division of Electrical Engineering and Computer Science, Kanazawa University, Ishikawa, Japan

  • Yasunori Tanaka

    • Division of Electrical Engineering and Computer Science, Kanazawa University, Ishikawa, Japan

  • Tatsuo Ishijima

    • Division of Electrical Engineering and Computer Science, Kanazawa University, Ishikawa, Japan

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• EUV-induced plasma: PIC modelling of a transient plasma fluxes

  ORAL

  Oct. 10, 2023, 2:15 PM – Oct. 10, 2023, 2:30 PM

  Presenters

  • Luuk Heijmans

    • ASML

  Authors

  • Luuk Heijmans

    • ASML

  • Dmitry Astakhov

    • ISTEQ

  • Efe Kemaneci

    • ASML

  • Andrei M Yakunin

    • ASML

  • Mark van de Kerkhof

    • ASML

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• Understanding and controlling the role of ions during plasma-enhanced ALD and ALE

  ORAL · Invited

  Oct. 10, 2023, 2:30 PM – Oct. 10, 2023, 3:00 PM

  Publication: Foundations of atomic-level plasma processing in nanoelectronics, K. Arts, S. Hamaguchi, T. Ito, K. Karahashi, H.C.M. Knoops, A.J.M. Mackus, W.M.M. Kessels, Plasma Sources Sci. Technol. 31, 103002 (2022).

  Presenters

  • Erwin Kessels

    • Eindhoven University of Technology

  Authors

  • Erwin Kessels

    • Eindhoven University of Technology

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• Evaluation of Interaction Between Substrate and Nanoparticles Deposited by Plasma Chemical Vapor Deposition

  ORAL

  Oct. 10, 2023, 3:00 PM – Oct. 10, 2023, 3:15 PM

  Presenters

  • Kazunori Koga

    • Kyushu University

  Authors

  • Kazunori Koga

    • Kyushu University

  • Shinjiro Ono

    • Kyushu University

  • Manato Eri

    • Kyushu University

  • Takamasa Okumura

    • Kyushu University

  • Kunihiro Kamataki

    • Kyushu University

  • Naoto Yamashita

    • Kyushu University

  • Naho Itagaki

    • Kyushu University

  • Masaharu Shiratani

    • Kyushu University

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• A Study on the Hydrogen Plasma induced material damage for EUV lithography Components and Material evaluation

  ORAL

  Oct. 10, 2023, 3:15 PM – Oct. 10, 2023, 3:30 PM

  Presenters

  • Eun-Seok Choe

    • Korea Research Institute of Standards and Science

  Authors

  • Eun-Seok Choe

    • Korea Research Institute of Standards and Science

  • Seungwook Choi

    • UST (University of Science and Technology)

  • Ansoon Kim

    • UST (University of Science and Technology)

  • Kwan-Yong Kim

    • Korea Research Institute of Standards and Science

  • HeeJung Yeom

    • Korea Research Institute of Standards and Science

  • Min Young Yoon

    • Korea Research Institute of Standards and science

  • Seongwan Hong

    • Korea Research Institute of Standards and Science

  • Dong-Wook Kim

    • Chungnam National University

  • Jung Hyung Kim

    • Korea Research Institute of Standards and Science

  • Hyo-Chang Lee

    • Korea Aerospace University

  View abstract →