Plasma Etching I

Presentations

• Dynamics of Plasma Atomic Layer Etching: Molecular Dynamics Simulations and Optical Emission Spectroscopy

  ORAL

  Oct. 10, 2023, 8:00 AM – Oct. 10, 2023, 8:15 AM

  Presenters

  • David B Graves

    • Princeton University

  Authors

  • David B Graves

    • Princeton University

  • Joseph R Vella

    • Princeton Plasma Physics Laboratory

  • Quinzen Hao

    • University of Houston

  • Vincent Donnelly

    • University of Houston

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• Studies on the discharge characteristics and atomic layer etching of high aspect ratio patterned-wafer in radio frequency biased inductively coupled plasma with Ar/C₄F₆ gas mixture

  ORAL

  Oct. 10, 2023, 8:15 AM – Oct. 10, 2023, 8:30 AM

  Publication: 1) M.Y. Yoon, H.J. Yeom, J.H. Kim, W. Chegal, Y.J. Cho, D.C. Kwon, J.R. Jeong, and H.C. Lee, Phys. Plasmas 28, 063504 (2021)

  Presenters

  • Min Young Yoon

    • Korea Research Institute of Standards and science

  Authors

  • Min Young Yoon

    • Korea Research Institute of Standards and science

  • HeeJung Yeom

    • Korea Research Institute of Standards and Science

  • Chegal Won

    • Korea Research Institute of Standards and Science

  • Yong Jai Cho

    • Korea Research Institute of Standards and Science

  • Deuk-Chul Kwon

    • Korea Institute of Fusion Energy
    • Korea institute of Fusion Energy

  • Jong-Ryul Jeong

    • Chungnam National University

  • Jung Hyung Kim

    • Korea Research Institute of Standards and Science

  • Hyo-Chang Lee

    • Korea Aerospace University

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• Peculiarities of Ion and Neutral Transport in Plasma Etch Applications

  ORAL · Invited

  Oct. 10, 2023, 8:30 AM – Oct. 10, 2023, 9:00 AM

  Presenters

  • Sergey Voronin

    • TEL TECHNOLOGY CENTER, AMERICA, LLC

  Authors

  • Sergey Voronin

    • TEL TECHNOLOGY CENTER, AMERICA, LLC

  • Qi Wang

    • TEL TECHNOLOGY CENTER, AMERICA, LLC

  • Nicholas Smieszek

    • TEL TECHNOLOGY CENTER, AMERICA, LLC

  • Pingshan Luan

    • TEL Technology Center, America, LLC
    • TEL TECHNOLOGY CENTER, AMERICA, LLC

  • Akiteru Ko

    • TEL TECHNOLOGY CENTER, AMERICA, LLC
    • TEL Technology Center, America, LLC

  • Christophe Vallee

    • TEL TECHNOLOGY CENTER, AMERICA, LLC

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• Atomic Layer Etching of Silicon in HBr-Containing Plasmas

  ORAL

  Oct. 10, 2023, 9:00 AM – Oct. 10, 2023, 9:15 AM

  Presenters

  • Vincent Donnelly

    • University of Houston

  Authors

  • Vincent Donnelly

    • University of Houston

  • Qinzhen Hao

    • University of Houston

  • Pilbum Kim

    • Samsung Electronics Co. Ltd.

  • Song-Yung Kang

    • Samsung Electronics Co. Ltd.

  • Sang Ki Nam

    • Samsung Electronics Co. Ltd.
    • Mechatronics Research, Samsung Electronics

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• OES-based Monitoring Method of Non-maxwellian EEDF and Radical Density for Etch Process Control in Ar/SF6/O2 VHF-CCP

  ORAL

  Oct. 10, 2023, 9:15 AM – Oct. 10, 2023, 9:30 AM

  Presenters

  • Ji-Won Kwon

    • Seoul Nat'l Univ.
    • Seoul National University

  Authors

  • Ji-Won Kwon

    • Seoul Nat'l Univ.
    • Seoul National University

  • Jihoon Park

    • Seoul Nat'l Univ.

  • Ingyu Lee

    • Seoul Nat'l Univ.

  • Gon-Ho Kim

    • Seoul Nat'l Univ.
    • Seoul National University

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