Modeling & Simulation IV: Low Pressure Plasma Sources
FOCUS · ER2 · ID: 1530712
Presentations
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Plasma Modeling and Diagnostics in Semiconductor Equipment Design
ORAL · Invited
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Presenters
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Saravanapriyan Sriraman
- Lam Research
Authors
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Saravanapriyan Sriraman
- Lam Research
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Effect of Electron Energy Distribution Functions on Plasma Behavior in Moderate-Pressure RF Capacitively Coupled Plasmas
ORAL
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Presenters
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Kallol Bera
- Applied Materials, Inc.
- Applied Materials
Authors
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Kallol Bera
- Applied Materials, Inc.
- Applied Materials
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Rupali Sahu
- Applied Materials, Inc.
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Nakul Nuwal
- Applied Materials, Inc.
- Applied Materials
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Abhishek Verma
- Applied Materials
- Applied Materials, Inc.
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Shahid Rauf
- Applied Materials, Inc.
- Applied Materials
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Evaluating power deposition in Inductively Coupled Plasma systems using the particle-in-cell code VSim
ORAL
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Presenters
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Eve Lanham
- Tech-X Corp
Authors
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Eve Lanham
- Tech-X Corp
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Daniel S Main
- Tech-X Corporation
- Tech-X Corp
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John R Cary
- University of Colorado, Boulder
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Thomas G Jenkins
- Tech-X Corporation
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Jarrod Leddy
- Tech-X Corp
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Scott E Kruger
- Tech-X Corp
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3D effects in the simulations of the magnetized DC plasma sources for ion implantation.
ORAL
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Presenters
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Alexandre Likhanskii
- Applied Materials
Authors
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Alexandre Likhanskii
- Applied Materials
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Andrei Smolyakov
- Univ Saskatchewan
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Mina Papahn Zadeh
- Univ of Saskatchewan
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Nirbhav S Chopra
- Princeton Plasma Physics Laboratory
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Yevgeny Raitses
- Princeton Plasma Physics Laboratory
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Improved Closure Models for Fluid Moment Modeling of Capacitively Coupled Plasmas
ORAL
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Presenters
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Adnan Mansour
- Stanford University
Authors
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Adnan Mansour
- Stanford University
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Alejandro Alvarez Laguna
- Laboratoire de Physique des Plasmas, CNRS, E. Polytechnique
- LPP-CNRS
- Stanford University
- Laboratoire de Physique des Plasmas, Ecole Polytechnique, CNRS
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Kentaro Hara
- Stanford University
- Applied Materials
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Simulations of EUV Induced Hydrogen Plasmas and In-Situ Tin Cleaning
ORAL
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Presenters
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Tugba Piskin
- University of Michigan
Authors
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Tugba Piskin
- University of Michigan
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Vladimir Volynets
- Samsung Electronics Co., Ltd.
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Sang Ki Nam
- Samsung Electronics Co. Ltd.
- Mechatronics Research, Samsung Electronics
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Hyunjae Lee
- Samsung Electronics Co.
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Mark J Kushner
- University of Michigan
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Atomic structure considerations for the low-temperature opacity of Xenon
ORAL
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Presenters
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Amanda Neukirch
- Los Alamos National Laboratory
- LANL
Authors
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Amanda Neukirch
- Los Alamos National Laboratory
- LANL
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James Colgan
- LANL
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