Diagnostics III

FOCUS · DF1 · ID: 1530243

Presentations

  • ORAL

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    Publication: [1] H. J. Yeom, J. H. Kim, D. H. Choi, E. S. Choi, M. Y. Yoon, D. J. Seong, Shin Jae You, and Hyo-Chang Lee, Flat cutoff probe for real-time electron density measurement in industrial plasma processing, Plasma Sources Sci. Technol. 29 (2020) 035016 (13pp)
    [2] Hyo-Chang Lee, Jung Hyung Kim, Daejin Seong, Hee Jung Yeom, PLANAR-TYPE PLASMA DIAGNOSIS APPARATUS, WAFER-TYPE PLASMA DIAGNOSIS APPARATUS IN WHICH PLANAR-TYPE PLASMA DIAGNOSIS APPARATUS IS BURIED, AND ELECTROSTATIC CHUCK IN WHICH PLANAR-TYPE PLASMA DIAGNOSIS APPARATUS IS BURIED, Korea Patent. 10-2020-0095022 , PCT Patent. PCT/KR2019/004500, US Patent. 17050373, China Patent. 201980028803.9, EU Patent. 19912976.8, Japan Patent. 52002369478
    [3] Hyo-Chang Lee, Jung Hyung Kim, Hee Jung Yeom, Device for measuring plasma ion density and Apparatus for
    plasma diagnostics using the same, Korea Patent. 1020210022899, US Patent. 17222937, China Patent. 2021110374496.9, EU Patent. 2021167098, Japan Patent. 7113110

    Presenters

    • HeeJung Yeom

      • Korea Research Institute of Standards and Science

    Authors

    • HeeJung Yeom

      • Korea Research Institute of Standards and Science

    • Min Young Yoon

      • Korea Research Institute of Standards and science

    • Eun-Seok Choe

      • Korea Research Institute of Standards and Science

    • Dae Jin Seong

      • Korea Research Institute of Standards and Science

    • Gwang-Seok Choi

      • Korea Research Institute of Standards and Science

    • Shin Jae You

      • Chungnam Natl Univ
      • Department of Physics, Chungnam National University

    • Jung Hyung Kim

      • Korea Research Institute of Standards and Science

    • Hyo-Chang Lee

      • Korea Aerospace University

    View abstract →