Calculation of Object Heating Affected by Radiation Distribution of Arc as Function of Current in Arc Lamp

Arc lamp is a light source with high radiation power and fast radiation start-up speed emitted from an arc formed between electrodes and are used for annealing in semiconductor manufacturing processes. In the annealing process, high intensity radiation is required for heating to high temperatures. One possible method is to increase the current of the arc discharge, which increases the temperature-dependent radiation energy with Joule heating. Although calculations of heating of objects from arc radiation have been performed, the optical thickness in the space between the emission source and the object has not been considered. To analyze the heating with synchrotron radiation during a current change, it is necessary to develop the calculation method that takes the optical thickness into account. In this research, object heating affected by radiation distribution of arc as function of current in arc lamp is calculated by three-dimensional electromagnetic thermal fluid simulation.