Analysis of Radiation Distribution Effected by Interelectrode Distance in Arc Lamps Using 3D Electromagnetic Three-Dimensional Electromagnetic Thermal Fluid Simulation

Arc lamps generate light with high luminance and high color rendering properties using arc discharges between electrodes. Taking advantage of this feature, arc lamps are used as an industrial light source to restore crystallinity in the heat treatment process of the semiconductor material surface. In order to create thinner semiconductors in crystalline recovery, heat treatment with less thermal diffusion and shorter time is required. For this reason, arc lamps require a short time to calculate the radiation power for each wavelength and the temporal variation of the radiation power. However, control of lamp radiation makes it difficult to make measurements on the heat treatment of surfaces. Therefore, it is difficult to utilize these results in product design. Many researchers of radiation power from steady-state analysis have researched, but few reports of time-varying radiation power have been published. In this research, the radiation distribution affected by the interelectrode distance in arc lamp was analyzed using a three-dimensional electromagnetic thermal fluid simulation. As a result, the radiation power generated at a specific coordinate increases with increasing interelectrode distance, and radiation distribution was generated on the semiconductor material surface.